Y. Hagio, K. Kasa, Sho Kawadahara, Manabu Takakuwa, Yosuke Takahata, Katsuya Kato, A. Nakae
{"title":"Overlay improvement for semiconductor manufacturing using Moiré effect","authors":"Y. Hagio, K. Kasa, Sho Kawadahara, Manabu Takakuwa, Yosuke Takahata, Katsuya Kato, A. Nakae","doi":"10.1109/ASMC49169.2020.9185396","DOIUrl":null,"url":null,"abstract":"In this paper, we demonstrate methodology of mark design for semiconductor device based on simulations, measurements and verification. We compared overlay performance of conventional overlay targets, as well as grating-over-grating imaging targets utilizing Moiré effect. Moiré target showed better accuracy, process robustness and precision with improved measurement technology.","PeriodicalId":6771,"journal":{"name":"2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"91 1","pages":"1-5"},"PeriodicalIF":0.0000,"publicationDate":"2020-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC49169.2020.9185396","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In this paper, we demonstrate methodology of mark design for semiconductor device based on simulations, measurements and verification. We compared overlay performance of conventional overlay targets, as well as grating-over-grating imaging targets utilizing Moiré effect. Moiré target showed better accuracy, process robustness and precision with improved measurement technology.
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