M. Vos, Sonali N. Chopra, J. Ekerdt, S. Agarwal, W. Kessels, A. Mackus
{"title":"Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design","authors":"M. Vos, Sonali N. Chopra, J. Ekerdt, S. Agarwal, W. Kessels, A. Mackus","doi":"10.1116/6.0000912","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":17571,"journal":{"name":"Journal of Vacuum Science and Technology","volume":"39 1","pages":"032412"},"PeriodicalIF":0.0000,"publicationDate":"2021-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0000912","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}