R. C. Da Silva, Paulo Jorge Duda De Morais, Andre Carvalho, Wagner De Rossi, C. Motta
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Abstract
The thermophoretic efficiency in the modified chemical vapour deposition (MCVD) process has been numerically determined under specified conditions of temperature and velocity field in the silica deposition tube. A CFD code was used to solve a steady-state numerical model of the MCVD process. The cumulative efficiency of $\text{SiO}_{2}$ and $\text{GeO}_{2}$ deposition was calculated along the tube length, yielding to a maximum value of 42% and 37 % respectivelly.
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