Influence of the well composition and thickness in the GaInP/InP/GaInAs/InP structure for HEMT

S. Loualiche, A. Le Corre, S. Salaun, S. Durel, D. Lecrosnier, C. Guillemot, C. Vaudry, L. Henry
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Abstract

Photoluminescence, Hall effect, and I-V characteristics of heterostructure InP/GaInAs/InP grown by gas source molecular beam epitaxy (MBE) are presented. The structure is chosen as an alternative to AlInAs/GaInAs/AlInAs to avoid the problems related to the presence of aluminum in HEMT structures. An extremely high indium concentration is used in the well to improve its performance. The InAs well degrades above 10 AA thickness. It is shown that the best experimental results are obtained with a 60 AA GaInAs well (82% InAs) with 2% lattice mismatch.<>
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GaInP/InP/GaInAs/InP结构中孔组成和厚度对HEMT的影响
研究了气源分子束外延(MBE)生长的异质结构InP/GaInAs/InP的光致发光、霍尔效应和I-V特性。选择该结构作为AlInAs/GaInAs/AlInAs的替代品,以避免与HEMT结构中铝的存在有关的问题。在井中使用极高的铟浓度来改善其性能。InAs井在10 AA厚度以上降解。结果表明,在晶格失配率为2%的情况下,60 AA的GaInAs(82%的InAs)得到了最好的实验结果
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