{"title":"Sensitivity-enhanced SERS substrate fabrication by nanoimprinting compressed PDMS elastomer","authors":"W. Kuo, Jiayue Yan, W. Chou, H. Yu","doi":"10.1109/OMN.2013.6659098","DOIUrl":null,"url":null,"abstract":"This paper reports a low-cost fabrication method of sensitivity-enhanced SERS substrate using nanoimprinting lithography. A PDMS elastomer with grating structure is deformed by compressing to achieve the better pitch for SERS substrate. Experimental results show that the sensitivity can be enhanced about three times by this method.","PeriodicalId":6334,"journal":{"name":"2013 International Conference on Optical MEMS and Nanophotonics (OMN)","volume":"14 1","pages":"139-140"},"PeriodicalIF":0.0000,"publicationDate":"2013-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 International Conference on Optical MEMS and Nanophotonics (OMN)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMN.2013.6659098","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper reports a low-cost fabrication method of sensitivity-enhanced SERS substrate using nanoimprinting lithography. A PDMS elastomer with grating structure is deformed by compressing to achieve the better pitch for SERS substrate. Experimental results show that the sensitivity can be enhanced about three times by this method.
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