Study of Physical Properties of Nanocrystalline NiO Thin Films Prepared by Spray Pyrolysis Technique

.. H.S.Gavale, .. M.S.Wagh, .. R.B.Ahirrao, S. R. Gosavi
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引用次数: 2

Abstract

Article history: Received 12 January 2019 Accepted 27 January 2019 Available online 07 February 2019 In this paper a systematic study has been carried out on the influence of thickness on the physical properties of nanocrystalline nickel oxide (NiO) thin films prepared on glass substrate by spray pyrolysis method. The prepared nanocrystalline NiO films were characterized using X-ray diffraction technique (XRD), field emission scanning electron microscopy (FESEM) and optical measurement techniques. XRD patterns reveal the cubic structure for all the samples and the crystallite size varies with the thickness. FESEM images confirmed that all the films are homogeneous, without any crack, dense and exhibit almost complete coverage of the substrate. The optical parameters such as transmittance, absorption coefficient and energy band gap of the films as a function of film thickness was investigated by UV-Vis spectrophotometer. The band gap of the films is found to be direct allowed transition and the variation of band gap values of nanocrystalline NiO thin films were found to be in the range of 3.48 eV to 3.53 eV.
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喷雾热解法制备纳米晶NiO薄膜的物理性质研究
本文系统研究了厚度对喷雾热解法制备纳米晶氧化镍(NiO)薄膜物理性能的影响。采用x射线衍射技术(XRD)、场发射扫描电镜(FESEM)和光学测量技术对制备的纳米晶NiO薄膜进行了表征。XRD图谱显示,所有样品均为立方结构,晶粒尺寸随厚度的变化而变化。FESEM图像证实,所有薄膜都是均匀的,没有任何裂纹,致密,几乎完全覆盖了衬底。利用紫外可见分光光度计研究了薄膜的透光率、吸收系数和能带隙等光学参数随薄膜厚度的变化规律。发现薄膜的带隙是直接允许跃迁的,纳米晶NiO薄膜带隙值的变化范围在3.48 eV ~ 3.53 eV之间。
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