The effect of offcut angle on electrical conductivity of wafer-bonded n-GaAs/n-GaAs structures for wafer-bonded tandem solar cells

K. Yeung, M. Goorsky
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引用次数: 2

Abstract

The effect of offcut angle on the electrical conductivity of III-V multijunction solar devices is investigated using n-GaAs/n-GaAs direct-bonded structures. In the solar industry, misoriented substrates are commonly used in the growth of III-V epitaxial layers. In addition, wafer bonding has been proposed as a potential method of integrating lattice-mismatched materials to avoid the formation of threading dislocations. Our previously published papers showed that sulfur passivation reduces the density of surface charge states and improves the interface conductivity. However, the impact of the offcut angle on the electrical properties has not been explored. n-GaAs wafers miscut towards <;111>; A are chosen and compared to nominal on-axis (001) substrates. The surfaces are treated with either an oxide etch or additional soak in aqueous (NH4)2S. Off-axis wafers are bonded face-to-face in various orientations and then annealed at 400 °C for two hours. It is observed that the electrical conductivity improves considerably with a short rapid thermal processing at 600 °C. However, the out-of-plane relative surface misorientations between the tilted (001) planes greater than 4° exhibit increasingly non-ohmic behavior. A theoretical model that describes the electron tunneling across a grain boundary between semiconductor bicrystals is used to represent the bonded interface and estimate the barrier conduction height. Fitting the zero-bias conductance over a range of temperatures reveals a 0.4 eV increase in barrier height for 12° misoriented sulfur-passivated bonded pairs. Accordingly, the interface resistance at room temperature rises from 0.01 Ω·cm2 to 3.4 Ω·cm2. These results demonstrate that the out-of-plane relative surface misorientation is the critical parameter to be monitored in order to achieve superior electrical conductivity in direct-bonded multijunction solar applications.
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边切角对晶圆键合n-GaAs/n-GaAs结构电导率的影响
采用n-GaAs/n-GaAs直接键合结构研究了截边角对III-V型多结太阳能器件电导率的影响。在太阳能工业中,误导衬底通常用于III-V外延层的生长。此外,晶圆键合已被提出作为集成晶格不匹配材料的潜在方法,以避免螺纹位错的形成。我们之前发表的论文表明,硫钝化降低了表面电荷态的密度,提高了界面导电性。然而,截角对材料电性能的影响尚未得到深入研究。n-GaAs晶圆错切;选择A并与标称轴上(001)基板进行比较。表面用氧化物蚀刻或在水(NH4)2S中额外浸泡处理。离轴晶圆在不同方向上面对面粘合,然后在400°C下退火两小时。观察到,在600°C下进行短时间快速热处理,电导率显著提高。然而,大于4°的倾斜(001)面之间的面外相对表面偏差表现出越来越多的非欧姆行为。利用描述电子穿越半导体双晶晶界的理论模型来表示键合界面并估计势垒导通高度。在一定温度范围内对零偏导进行拟合,结果表明,12°定向失稳硫钝化键对的势垒高度增加了0.4 eV。相应地,室温下的界面电阻从0.01 Ω·cm2上升到3.4 Ω·cm2。这些结果表明,为了在直接键合多结太阳能应用中获得优异的导电性,面外相对表面取向偏差是需要监测的关键参数。
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