Possible applications of topological insulator thin films for tunnel FETs

Jiwon Chang, L. Register, S. Banerjee
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引用次数: 2

Abstract

We have begun to explore the possibility of thin film three dimensional (3D) topological insulator (TI) based tunnel FETs (TFETs), specifically Bi2Se3 here, using quantum ballistic transport simulations with a tight-binding Hamiltonian in the atomic orbital basis including spin degrees of freedom. TI-based TFETs would be analogous in some ways to graphene nanoribbon TFETs, but without the sensitivity to ribbon width and edge roughness, and in some ways to narrow gap III-V TFETs but with substantially thinner quantum well widths.
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拓扑绝缘体薄膜在隧道场效应管中的可能应用
我们已经开始探索基于薄膜三维(3D)拓扑绝缘体(TI)的隧道场效应管(tfet)的可能性,特别是在这里的Bi2Se3,使用原子轨道基中包含自旋自由度的紧密结合哈密顿量的量子弹道输运模拟。钛基tfet在某些方面类似于石墨烯纳米带tfet,但没有对带宽度和边缘粗糙度的敏感性,并且在某些方面缩小了III-V型tfet的间隙,但量子阱宽度明显更薄。
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