{"title":"C60 DECOMPOSITION ON SOME TRANSITION METAL AND SEMICONDUCTOR SURFACES","authors":"N. Gall’, E. Rut'kov, A. Tontegode","doi":"10.1081/FST-100102971","DOIUrl":null,"url":null,"abstract":"A deep understanding of fullerene-surface interaction regularities is a key to widespread fullerene use. We have studied C60 molecular adsorption, thermal transformation and initial film growth stages on four transition metals: W, Mo, Re and Ir in the wide temperature range 300–2000K. Experiments were performed in ultra-high vacuum (UHV) at P < 10−9 Torr by high resolution Auger electron spectroscopy, atomic force microscopy and thermal desorption mass-spectrometry using an absolutely calibrated flux of the depositing C60 molecules.","PeriodicalId":12470,"journal":{"name":"Fullerene Science and Technology","volume":"15 1","pages":"241 - 246"},"PeriodicalIF":0.0000,"publicationDate":"2001-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Fullerene Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1081/FST-100102971","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
A deep understanding of fullerene-surface interaction regularities is a key to widespread fullerene use. We have studied C60 molecular adsorption, thermal transformation and initial film growth stages on four transition metals: W, Mo, Re and Ir in the wide temperature range 300–2000K. Experiments were performed in ultra-high vacuum (UHV) at P < 10−9 Torr by high resolution Auger electron spectroscopy, atomic force microscopy and thermal desorption mass-spectrometry using an absolutely calibrated flux of the depositing C60 molecules.