Impact of Source-Drain Tunneling on Double-Gate Performance

A. Spinelli, R. Gusmeroli
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Abstract

We investigate the effects of source-drain tunneling on the performance of double-gate MOS devices with a 2D quantum-mechanical model. We show that a clear signature of the source-drain tunneling current is observable in the subthreshold behavior, affecting device performance even at room temperature. Dependences of the tunneling current on the main design variables are then analyzed in detail
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源漏隧道对双栅性能的影响
利用二维量子力学模型研究了源漏隧道效应对双栅MOS器件性能的影响。我们表明,在亚阈值行为中可以观察到源极-漏极隧道电流的清晰特征,即使在室温下也会影响器件性能。然后详细分析了隧道电流对主要设计变量的依赖关系
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Front Matter: Volume 12072 Front Matter: Volume 12073 Multi-Energy Domain Modeling of Microdevices: Virtual Prototyping by Predictive Simulation A Monte Carlo Investigation of Nanocrystal Memory Reliability Difficulties on the estimation of the thermal structure function from noisy thermal impedance transients
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