{"title":"Overlay metrology for next generation lithography at CMS","authors":"Y. Ku, H. Tai, Chia-Teng Chang","doi":"10.1109/NANO.2007.4601351","DOIUrl":null,"url":null,"abstract":"The center for measurement standards (CMS) has a research program in optical overlay metrology. The main goal of this work is to improve overlay measurement accuracy. Two main threads are developed to the work - novel in-chip overlay target design, and best algorithm. The former is hoped to prove a capability for measuring overlay error inside the active area of product devices. The later is for extracting the most from image detail.","PeriodicalId":6415,"journal":{"name":"2007 7th IEEE Conference on Nanotechnology (IEEE NANO)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2007-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 7th IEEE Conference on Nanotechnology (IEEE NANO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO.2007.4601351","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The center for measurement standards (CMS) has a research program in optical overlay metrology. The main goal of this work is to improve overlay measurement accuracy. Two main threads are developed to the work - novel in-chip overlay target design, and best algorithm. The former is hoped to prove a capability for measuring overlay error inside the active area of product devices. The later is for extracting the most from image detail.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
