Simulation of charge multiplication and trap-assisted tunneling in irradiated planar pixel sensors

M. Benoit, A. Lounis, N. Dinu
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引用次数: 6

Abstract

We present a model for the TCAD simulation of charge multiplication and trap-to-band tunneling to explain the discrepancies between the experimentally observed charge collection in highly irradiated planar pixel sensors and the predictions made using the Hamburg model. DC and transient TCAD simulations of one dimensional n-in-p diodes were performed and reproduce well the observed behavior of diode irradiated to fluences of the order of 1015–16 neq cm−2. The results of the simulations show that impact ionization and de-trapping due to tunneling qualitatively explain the behavior of irradiated sensors observed experimentally.
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辐照平面像素传感器中电荷倍增和阱辅助隧穿的模拟
我们提出了一个电荷倍增和陷阱到带隧道的TCAD模拟模型,以解释在高辐照平面像素传感器中实验观察到的电荷收集与使用汉堡模型做出的预测之间的差异。对一维n-in-p二极管进行了直流和瞬态TCAD模拟,并很好地再现了在1015-16 neq cm−2量级的影响下二极管的观察行为。模拟结果表明,隧穿引起的冲击电离和脱陷定性地解释了实验观察到的辐照传感器的行为。
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