Zhenjiao Wang, P. Han, Qinglei Meng, H. Qian, Jiaqi Wu, Yongfei Jiang, N. Tang, Hongyan Lu, Haidong Zhu, Rulong Chen, P. Yang, J. Ji, Zhengrong Shi, A. Sugianto, S. Wenhem
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Abstract
In this paper, progress results on the next generation Pluto technology were reported. In the next generation Pluto, we focused on the rear surface design, by improvement of the back internal reflection and passivation we got 20.3% cell efficiency with very high Jsc. Still there is further improvement of the cell design to get high FF and Eff.
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