Topological layer switch technique for monolithically integrated electrostatic XYZ-stage

Kazuhiro Takahashi, M. Mita, Hiroyuki Fujita, H. Toshiyoshi
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引用次数: 10

Abstract

We report a monolithic XYZ-stage with electrostatic comb-mechanisms integrated in only two silicon layers and by three photolithography steps that topologically switches the allocation of layer for electrical and elastic components. The XY-stage moved in the X- and the Y-direction by 19 mum independently, and also in the diagonal direction. We have successfully demonstrated maximum 2.12 mum in the Z-direction with applied voltage of 200 V.
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单片集成静电xyz级的拓扑层开关技术
我们报告了一个单片xyz级静电梳机制集成在只有两个硅层和三个光刻步骤,拓扑上切换层的分配为电气和弹性组件。X-阶段分别在X和y方向上移动了19 μ m,也在对角线方向上移动。我们已经成功地演示了在施加200 V电压的情况下,z方向上的最大2.12 mum。
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