{"title":"Special Section Guest Editorial: Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications","authors":"S. Engelmann, R. Wise, R. Gronheid, N. Felix","doi":"10.1117/1.JMM.18.1.011001","DOIUrl":null,"url":null,"abstract":"Abstract. This guest editorial summarizes the Special Section on Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications","PeriodicalId":16522,"journal":{"name":"Journal of Micro/Nanolithography, MEMS, and MOEMS","volume":"86 1","pages":"011001 - 011001"},"PeriodicalIF":1.5000,"publicationDate":"2019-01-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanolithography, MEMS, and MOEMS","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1117/1.JMM.18.1.011001","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 1
Abstract
Abstract. This guest editorial summarizes the Special Section on Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
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