Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint

Abstract

Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.