Stable and epitaxial metal/III-V semiconductor heterostructures

T. Sands, C.J. Palmstrøm, J.P. Harbison, V.G. Keramidas, N. Tabatabaie, T.L. Cheeks, R. Ramesh, Y. Silberberg
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引用次数: 159

Abstract

Long before the advent of nanofabrication and quantum-effect devices, the technological limitations imposed by polycrystalline, multiphase and thermally unstable contacts to III-V semiconductors were of concern to forward-looking materials scientists. In the early 1980s, efforts to elucidate the complex behaviour of reactive metal/III-V systems were initiated. These early efforts evolved slowly and culminated in the recent achievement of stable and epitaxial metallizations to III-V semiconductors. In this review, we first describe the criteria that must be met for the fabrication of metal/III-V heterostructures. Bulk phase equilibria are useful guides for selecting metal/semiconductor combinations which will not react during growth at moderate temperatures or during subsequent processing steps. We show, however, that phase stability is not sufficient for the fabrication of ultrathin metal overlayers or buried metal heterostructures. Growth conditions must be carefully optimized and combined with the appropriate selection of metallic phases with high melting points in order to suppress the strong tendency for island formation during growth and film agglomeration during overgrowth or processing. In our discussion of metal/semiconductor hetero-structures we highlight the relationship between symmetry differences and defects (domain boundaries) with particular emphasis on semiconductor overlayers grown on high-symmetry metals. Our work and that of others has shown that stable and epitaxial metallizations to III-V semiconductors as well as more complex metal/III-V heterostructures can be achieved with two classes of metallic materials; the transition-metal gallides and aluminides with the CsCl structure (TM-III) and the rare-earth monopnictides with the NaCl structure (RE-V). We discuss and compare the growth of these III-V/TM-III/III-V and III-V/RE-V/III-V heterostructures by molecular beam epitaxy, focusing special attention to the initial stages of growth of metallic films on III-V substrates and III-V overlayers on metallic films. Going beyond the strictly materials issues, we describe the electrical properties of such heterostructures, including stable enhanced-barrier Schottky contacts and semiconductor-clad metallic quantum wells, structures which may be the basis for exciting and novel electronic, photonic and magnetic devices.

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稳定和外延金属/III-V半导体异质结构
早在纳米制造和量子效应器件出现之前,多晶、多相和热不稳定接触给III-V半导体带来的技术限制就一直是前瞻性材料科学家关注的问题。在20世纪80年代初,开始努力阐明活性金属/III-V系统的复杂行为。这些早期的努力进展缓慢,并在最近的III-V半导体的稳定和外延金属化成就中达到高潮。在这篇综述中,我们首先描述了制造金属/III-V异质结构必须满足的标准。体相平衡是选择在中等温度下生长或在随后的加工步骤中不会发生反应的金属/半导体组合的有用指南。然而,我们表明,相稳定性不足以制造超薄金属覆盖层或埋藏的金属异质结构。必须仔细优化生长条件,并适当选择高熔点的金属相,以抑制生长过程中强烈的岛状形成倾向和过度生长或加工过程中的薄膜团聚倾向。在我们对金属/半导体异质结构的讨论中,我们强调了对称性差异和缺陷(畴边界)之间的关系,特别强调了在高对称性金属上生长的半导体覆盖层。我们和其他人的工作已经表明,稳定和外延金属化到III-V半导体以及更复杂的金属/III-V异质结构可以实现两类金属材料;具有CsCl结构的过渡金属镓化物和铝化物(TM-III)和具有NaCl结构的稀土单糖(RE-V)。我们讨论并比较了这些III-V/TM-III/III-V和III-V/RE-V/III-V异质结构的分子束外延生长,特别关注了III-V衬底上金属膜和III-V覆盖层在金属膜上生长的初始阶段。超越严格的材料问题,我们描述了这种异质结构的电学性质,包括稳定的增强势垒肖特基触点和半导体包层金属量子阱,这些结构可能是令人兴奋的新型电子、光子和磁性器件的基础。
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