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Processing and microstructural control: lessons from natural materials 加工和微观结构控制:来自天然材料的经验教训
Pub Date : 1993-08-16 DOI: 10.1016/0920-2307(93)90006-Z
Christopher Viney

Renewable natural materials have been exploited for several millennia. Within the past two decades, it has become apparent that materials science can benefit from a detailed knowledge of the synthetic pathways and molecular self-assembly mechanisms by which natural materials are produced. This review describes the most significant classes of macromolecule used in the synthesis of biological materials. It explains how the techniques of genetic engineering can be employed to modify the structure or quantitative yield of these materials. The role of the liquid crystalline state in materials self-assembly, and the effects of hierachical molecular order on the properties of natural materials, are emphasized. The wide range of contexts in which biological principles have impacted materials science is illustrated with several specific examples.

可再生的天然材料已经被开发了几千年。在过去的二十年里,很明显,材料科学可以从合成途径和分子自组装机制的详细知识中受益,天然材料是通过这些途径产生的。本文综述了用于生物材料合成的最重要的大分子类别。它解释了如何利用基因工程技术来修改这些材料的结构或定量产量。强调了液晶状态在材料自组装中的作用,以及层次分子顺序对天然材料性质的影响。生物学原理影响材料科学的广泛背景用几个具体的例子来说明。
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引用次数: 9
Application of Mössbauer effect spectroscopy to the study of quasicrystalline materials Mössbauer效应光谱在准晶材料研究中的应用
Pub Date : 1993-08-02 DOI: 10.1016/0920-2307(93)90005-Y
R.A. Dunlap, D.W. Lawther

The application of Mössbauer effect spectroscopy to the study of both icosahedral and decagonal quasicrystalline solids is reviewed. The application of different fitting models to both paramagnetic and weakly ferromagnetic quasicrystalline alloys is discussed, as well as the interpretation of information obtained from these data. Measurements from the literature are reviewed and are considered in the context of structural, electronic and magnetic models of quasicrystalline ordering in solids. New experimental results for stable quasicrystalline alloys with both icosahedral and decagonal symmetry are presented, as are extensions of the analyses previously presented in the literature for a number of systems, and these results are discussed in the context of the fundamental physical properties of these materials.

综述了Mössbauer效应光谱在二十面体准晶固体和十面体准晶固体研究中的应用。讨论了不同拟合模型在顺磁性和弱铁磁性准晶合金中的应用,以及对这些数据所得信息的解释。从文献的测量进行了回顾,并考虑在固体准晶有序的结构,电子和磁性模型的背景下。提出了具有二十面体和十面体对称的稳定准晶合金的新实验结果,以及先前文献中对许多系统的分析的扩展,并在这些材料的基本物理性质的背景下讨论了这些结果。
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引用次数: 6
Electronic and optical properties of conducting polymer thin films 导电聚合物薄膜的电子和光学性质
Pub Date : 1993-07-15 DOI: 10.1016/0920-2307(93)90004-X
H. Stubb, E. Punkka, J. Paloheimo

Experimental studies on the electronic and optical properties of conductingpolymer thin films are reviewed. Conducting polymers have been processed into various forms of undoped and doped thin films. The electrical conduction properties have been characterized by conventional transport measurements as well as by the fabrication and evaluation of polymeric semiconductor devices. Important electrical and structural material parameters are extracted by fitting the results to conductivity models. Optical and electro-optical measurements give valuable information on the structural order, the electronic structure, and the unusual nature of charge carriers in these novel materials. The polymeric devices are mainly utilized in material characterization, but possible implications for applications are also discussed.

综述了导电聚合物薄膜的电子和光学性质的实验研究。导电聚合物已被加工成各种形式的未掺杂和掺杂薄膜。通过传统的输运测量以及聚合物半导体器件的制造和评价,表征了导电性能。通过将结果拟合到电导率模型中,提取出重要的电学和结构材料参数。光学和电光测量为这些新型材料的结构顺序、电子结构和载流子的不寻常性质提供了有价值的信息。聚合物器件主要用于材料表征,但也讨论了可能的应用意义。
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引用次数: 22
Thin film compound phase formation sequence: An effective heat of formation model 薄膜复合相形成序列:一种有效的形成热模型
Pub Date : 1993-07-01 DOI: 10.1016/0920-2307(93)90003-W
R. Pretorius, T.K. Marais, C.C. Theron

An effective heat of formation (EHF) model for predicting compound phase formation sequence is described. The EHF model defines an effective heat of formation ΔH′, which is concentration-dependent. By choosing the effective concentration of the interacting species at the growth interface to be that of the liquidus minimum, the model correctly predicts first phase formation during formation of silicides, germanides, aluminides and other metal-metal binary systems. The ability to predict phase formation sequence and phase decomposition is illustrated for some silicide and aluminide systems. The EHF model is also used to describe phase formation in lateral and bulk diffusion couples and for the interpretation of the effects of impurities and diffusion barriers on phase formation. It is also shown how the EHF model can be applied to laser and ion-beam induced phase formation and to the formation of amorphous and metastable phases. A compilation of recommended heats of formation for many silicide, germanide, aluminide and other metal-metal binary systems is given. In cases where experimental heats of formation were not available or if they were suspected of being unreliable, use was made of calculated values according to Miedema's model.

介绍了一种预测复合相形成顺序的有效生成热模型。EHF模型定义了有效地层热ΔH ',它与浓度有关。通过选择生长界面处相互作用物质的有效浓度为液相线的最小值,该模型正确地预测了硅化物、锗化物、铝化物和其他金属-金属二元体系形成过程中的第一相形成。对某些硅化物和铝化物体系的相形成顺序和相分解进行了预测。EHF模型也用于描述横向和体扩散对中的相形成,并用于解释杂质和扩散障碍对相形成的影响。本文还展示了EHF模型如何应用于激光和离子束诱导相的形成以及非晶相和亚稳相的形成。给出了许多硅化物、锗化物、铝化物和其他金属-金属二元体系的推荐生成热汇编。在无法获得实验生成热或怀疑它们不可靠的情况下,根据米德马的模型使用计算值。
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引用次数: 113
Chemical mapping and its application to interfaces, point defects and materials processing 化学作图及其在界面、点缺陷和材料加工中的应用
Pub Date : 1993-03-01 DOI: 10.1016/S0920-2307(93)90009-4
A. Ourmazd, A. Ourmazd

This review has two primary aims. First, it describes how the composition of materials may be quantitatively mapped with near-atomic resolution and sensitivity. Second,it outlines how this capability may be used to investigate important solid-state phenomena at the microscopic level. Specifically, the following topics are considered: interfacial roughness in semiconductor heterostructures and its effect on the optical properties of quantum wells; stability of modern interfaces against interdiffusion during typical annealing treatments; diffusion of intrinsic point defects in semiconductors; and the microscopics of ion implantation.

这篇综述有两个主要目的。首先,它描述了如何以接近原子的分辨率和灵敏度定量地绘制材料的组成。其次,它概述了如何利用这种能力在微观水平上研究重要的固态现象。具体来说,考虑了以下主题:半导体异质结构中的界面粗糙度及其对量子阱光学性质的影响;典型退火过程中现代界面抗互扩散的稳定性半导体中本征点缺陷的扩散还有离子注入的显微镜。
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引用次数: 10
The embedded-atom method: a review of theory and applications 嵌入原子方法:理论与应用综述
Pub Date : 1993-03-01 DOI: 10.1016/0920-2307(93)90001-U
Murray S. Daw , Stephen M. Foiles , Michael I. Baskes

The embedded-atom method is a semi-empirical method for performing calculations of defects in metals. The EAM incorporates a picture of metallic bonding, for which there is some fundamental basis. The limitations of the EAM are fairly well characterized: it works best for purely metallic systems with no directional bonding; it does not treat covalency or significant charge transfer; and it does not handle Fermi-surface effects. The main physical property incorporated in the EAM is the moderation of bond strength by other bonds (coordination-dependent bond strength). Within these constraints, the EAM provides a very useful and robust means of calculating approximate structure and energetics, from which many interesting properties of metals can be obtained.

We believe that atomistic calculations will continue to play an important role in the development of materials theory. Where the EAM can be useful, there is a tremendous number of interesting projects that have yet to be carried out. The understanding of mechanical properties on an atomistic level has only just begun. For materials where the EAM is not expected to work well, there are recent developments which may allow calculations similar to those presented here. We have mentioned already the problem of treating directional bonding in semiconductors and elements from the transition series. One approach which promises to be useful for treating directional bonding is reviewed by Carlsson [70]; the interested reader is encouraged to start there.

嵌入原子法是一种计算金属缺陷的半经验方法。EAM结合了金属键合的图像,这有一些基本的基础。EAM的局限性非常明显:它最适用于没有定向键合的纯金属体系;它不处理共价或显著电荷转移;而且它不处理费米表面效应。纳入EAM的主要物理性质是其他键对键强度的调节(依赖于配位的键强度)。在这些限制条件下,EAM提供了一种非常有用和可靠的方法来计算近似结构和能量学,从中可以获得许多有趣的金属性质。我们相信原子计算将继续在材料理论的发展中发挥重要作用。在EAM可以发挥作用的地方,有大量有趣的项目尚未实施。在原子水平上对力学性质的理解才刚刚开始。对于EAM不能很好地工作的材料,最近的发展可能允许类似于这里介绍的计算。我们已经提到了处理半导体和过渡系列元件中的定向键的问题。一种有望用于治疗定向键的方法由Carlsson[70]进行了回顾;我们鼓励感兴趣的读者从这里开始。
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引用次数: 1220
Electrical and optical properties of silicide single crystals and thin films 硅化物单晶和薄膜的电学和光学性质
Pub Date : 1993-02-01 DOI: 10.1016/0920-2307(93)90007-2
F. Nava , K.N. Tu, O. Thomas, J.P. Senateur, R. Madar, A. Borghesi, G. Guizzetti, U. Gottlieb, O. Laborde, O. Bisi

Electrical transport and optical properties of transition-metal silicides are reviewed. They are integrated with thermal properties of single-crystal silicides. Most of these compounds behave as metals while some of them behave as semiconductors. The former show an increasing electrical resistivity ρ with increasing temperature. Several of them show a non-classical deviation of ρ(T) from linearity in the high-temperature limit. This deviation, related to intrinsic properties of the compound, can be affected both in sign and in amount by the presence of foreign atoms (impurities) and structural defects. Moreover, defects dominate the electrical transport at low temperatures both in metallic and semiconducting compounds. Therefore, the interpretation of the electrical properties measured as a function of temperature may give a non-realistic description of silicide intrinsic properties. Since also other physical properties, like thermal and optical ones, can be strongly affected by impurities and defects, results about single-crystal silicides will be first illustrated. Single-crystal preparation and structural characterization are described in detail, with emphasis on crystalline quality in terms of residual resistivity ratio. The electrical quantities, resistivity and magnetoresistance, are measured as a function of temperature and along the main crystallographic directions. The effect of impurities and defects on the transport properties is then evaluated by examining the electrical transport of polycrystalline thin-film silicides. The different contributions to the total resistivity are measured by changing: (i) film stoichiometry, (ii) impurity concentration, (iii) texture growth and (iv) film thickness. Hall-coefficient measurements are briefly discussed with the main purpose to evidence that great caution is necessary when deducing mobility and charge-carrier density values from these data. The theoretical models currently used to interpret the low- and high-temperature resistivity behavior of the metallic silicides are presented and used to fit the experimental resistivity curves. The results of these studies reveal that in several cases there are well-defined temperature ranges in which a specific electron—phonon scattering mechanism dominates. This allows a more detailed study of the microscopic processes. The optical functions from the far-infrared to the vacuum ultraviolet, derived from Kramers—Krönig analysis of reflectance spectra or directly measured by spectroscopic ellipsometry, are presented and discussed for some significant metallic disilicides, both single crystals and polycrystalline films. Different physical phenomena are distinguished in the spectra: intraband transitions at the lowest photon energies, interband transitions at higher energies, and collective oscillations. In particular, the free-carrier response derived from this analysis is compared with the transport results. The interpretation of

综述了过渡金属硅化物的电输运和光学性质。它们与单晶硅化物的热性能相结合。这些化合物中的大多数表现为金属,而其中一些表现为半导体。前者的电阻率ρ随温度升高而增大。其中一些在高温极限下显示出ρ(T)偏离线性的非经典偏差。这种偏差与化合物的固有性质有关,可以受到外来原子(杂质)和结构缺陷的存在的影响。此外,在金属和半导体化合物的低温下,缺陷主导着电输运。因此,将测量的电学性质解释为温度的函数可能会对硅化物的内在性质给出不现实的描述。由于其他物理性质,如热学和光学性质,也会受到杂质和缺陷的强烈影响,所以关于单晶硅化物的结果将首先得到说明。详细描述了单晶的制备和结构表征,重点介绍了剩余电阻率方面的晶体质量。电学量,电阻率和磁电阻,作为温度的函数,沿着主要的晶体学方向测量。然后通过检测多晶硅化薄膜的电输运来评估杂质和缺陷对输运性质的影响。对总电阻率的不同贡献是通过改变:(i)薄膜化学计量,(ii)杂质浓度,(iii)织构生长和(iv)薄膜厚度来测量的。简要讨论霍尔系数的测量,主要目的是证明从这些数据推断迁移率和载流子密度值时需要非常谨慎。提出了目前用于解释金属硅化物低温和高温电阻率行为的理论模型,并将其用于拟合实验电阻率曲线。这些研究的结果表明,在一些情况下,有明确的温度范围,其中特定的电子-声子散射机制占主导地位。这样就可以对微观过程进行更详细的研究。本文给出并讨论了一些重要的金属二硅酸盐单晶和多晶薄膜的远红外到真空紫外的光学函数,这些函数是由Kramers-Krönig反射光谱分析或椭偏光谱直接测量得到的。光谱中有不同的物理现象:最低光子能量的带内跃迁,高能量的带间跃迁和集体振荡。特别地,由该分析得到的自由载流子响应与输运结果进行了比较。实验光谱的解释是基于计算得到的电子结构或光学函数。此外,还说明了光学研究如何有助于确定地评价某些二硅酸盐的半导体特性。本文报道了单晶在0.1 ~ 8k之间的比热测量。德拜温度和费米表面的电子态密度分别由晶格和电子贡献推导出来。一些硅化物已被发现具有很小的电子-声子耦合常数的超导体。重点比较了这些研究所得的性质与电输运数据分析所得的性质。这篇综述的最后一部分致力于一些微观物理量的计算,例如电子平均自由程,载流子密度,费米速度。利用与实验电阻率曲线最拟合的参数、红外光谱得到的自由载流子参数和比热测量得到的费米表面电子态密度进行评价。
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引用次数: 77
Non-linear optical materials and applications 非线性光学材料及其应用
Pub Date : 1993-01-01 DOI: 10.1016/0920-2307(93)90008-3
Y. Fainman, J. Ma, S.H. Lee

A review is given of the present status of the non-linear optical materials and devices, and their applications for optical signal processing and computing. The primary motivation behind this review is to introduce the different areas involved, paying special attention to their interfaces. First, the optical non-linearities in semiconductor materials, semiconductor microstructures and photorefractive materials are introduced. For the semiconductors we discuss the third-order non-linear susceptibilities due to virtual transitions (e.g., bound electrons in intrinsic semiconductors and non-linear motion and energy relaxation of free carriers in doped semiconductors) and due to real transitions (e.g. valence-to-conduction-band transitions, free-carrier transitions, impurity transitions and transitions in excitons and excitonic complexes). Recent advances in engineering semiconductor microstructures are discussed and shown to enhance their third-order non-linear optical susceptibilities in comparison with the bulk semiconductors. The mechanism of the photorefractive effect is next introduced and analyzed in conjunction with several engineering approaches to enhance the performances of the photorefractive non-linearities (e.g., non-stationary recording, multiphoton excitation, combination of the photorefractive effect with the electrorefractive non-linearities near the band edge, etc.). Using the photorefractive materials as an example, we define a set of figures of merit based on the requirements from the optical devices for system applications. Using these figures of merit we evaluate and discuss the optimization of different photorefractive materials: ferroelectric oxides (e.g., LiNbO3, BaTiO3, KNbO3, tungsten bronze family, etc.), compound semiconductors (e.g., GaAs, GaP, InP, CdS, CdSe, CdTe, etc.), silenites (e.g., Bi12SiO20, Bi12GeO20), and ceramics. Finally, the applications of non-linear optical materials are discussed using the photorefractive materials as an example. Two types of devices are distinguished: passive devices that are based on volume holographic storage of information and active devices that are based on continuous two-wave and four-wave mixing of optical information carrying waves. These devices are evaluated and their optimization is discussed in conjunction with applications to analog and digital optical signal processing and computing. Examples of analog (e.g., inverse filter and linear algebra processor) and digital (e.g., parallel access optical memories and reconfigurable interconnects) optical computing applications will be also discussed.

综述了非线性光学材料和器件的研究现状及其在光信号处理和计算中的应用。这篇综述背后的主要动机是介绍所涉及的不同领域,特别注意它们的接口。首先,介绍了半导体材料、半导体微结构和光折变材料中的光学非线性。对于半导体,我们讨论了由于虚跃迁(例如,本征半导体中的束缚电子和掺杂半导体中自由载流子的非线性运动和能量弛豫)和由于实跃迁(例如,价-导带跃迁,自由载流子跃迁,杂质跃迁和激子和激子复合物中的跃迁)引起的三阶非线性磁化率。讨论了工程半导体微结构在提高三阶非线性光学敏感性方面的最新进展。然后介绍并分析了光折变效应的机理,并结合几种提高光折变非线性性能的工程方法(如非平稳记录、多光子激发、光折变效应与近带边电折变非线性的结合等)进行了分析。以光折变材料为例,根据光学器件对系统应用的要求,定义了一套性能指标。利用这些优点,我们评估和讨论了不同光折变材料的优化:铁电氧化物(例如,LiNbO3, BaTiO3, KNbO3,钨青铜家族等),化合物半导体(例如,GaAs, GaP, InP, CdS, CdSe, CdTe等),硅矿(例如,Bi12SiO20, Bi12GeO20)和陶瓷。最后,以光折变材料为例,讨论了非线性光学材料的应用。区分了两种类型的器件:基于信息体全息存储的无源器件和基于光学信息携带波的连续两波和四波混合的有源器件。对这些器件进行了评估,并结合模拟和数字光信号处理和计算的应用讨论了它们的优化。模拟(例如,逆滤波器和线性代数处理器)和数字(例如,并行访问光存储器和可重构互连)光计算应用的例子也将被讨论。
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引用次数: 39
Copper deposition and thermal stability issues in copper-based metallization for ULSI technology ULSI技术中铜基金属化的铜沉积和热稳定性问题
Pub Date : 1992-12-01 DOI: 10.1016/0920-2307(92)90011-O
Jian Li , Y. Shacham-Diamand, J.W. Mayer

Recent interest in Cu-based metallization for ultra-large scale integrated (ULSI) devices has stimulated extensive studies on its thermal stability issues, as well as the search of novel deposition and etching processes. Cu is a candidate for global interconnection in the upper-level metallization in ULSI technology due to its low resistivity and high electromigration resistance. The electroless plating technique has proved capable of selective Cu growth in a planarized structure with minimum linewidth as small as 0.1 μm. Some of the practical aspects in the Cu patterning to produce non-planar and fully planar Cu fine lines will be presented in this paper. We are concerned with the thermal stability of Cu in structures of CuSi, Cu/silicide, Cu/metals, Cu/polymer and CuSiO2. We investigated the interfacial reactions in these structures by Rutherford backscattering (RBS), transmission electron microscopy (TEM) and Auger electron spectroscopy (AES). Cu reacts with Si, most metals and their silicides at relatively low temperatures. The adhesion of Cu on most dielectric substrates is poor. Oxidation of Cu occurs at very low temperature. These obstacles can be overcome by employing diffusion barriers, adhesion promotors, and passivation layers. Incorporation of alloying elements used in the formation of self-encapsulation and adhesion layers for Cu wiring is introduced. The validity of diffusion barriers has been tested in several copper-based layered structures. We also summarize recent work on electromigration, stress migration, and Cu dry etching in Cu-based metallization.

最近对超大型集成(ULSI)器件的铜基金属化的兴趣刺激了对其热稳定性问题的广泛研究,以及对新型沉积和蚀刻工艺的研究。由于其低电阻率和高电迁移电阻性,Cu是ULSI技术中上层金属化的全球互连的候选材料。化学镀技术已被证明能够在最小线宽小至0.1 μm的平面结构中选择性地生长Cu。本文将介绍在铜图像化中产生非平面和全平面铜细线的一些实际方面。研究了Cu在CuSi、Cu/硅化物、Cu/金属、Cu/聚合物和CuSiO2结构中的热稳定性。利用卢瑟福后向散射(RBS)、透射电子显微镜(TEM)和俄歇电子能谱(AES)研究了这些结构中的界面反应。铜在相对较低的温度下与硅、大多数金属及其硅化物反应。铜在大多数介质衬底上的附着力很差。铜的氧化发生在很低的温度下。这些障碍可以通过采用扩散屏障、粘附促进剂和钝化层来克服。介绍了在铜布线中加入合金元素形成自封装层和粘附层的方法。在几种铜基层状结构中测试了扩散屏障的有效性。总结了近年来在电迁移、应力迁移和铜基金属化中的干蚀刻等方面的研究进展。
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引用次数: 92
Synchrotron X-radiation topography 同步加速器x射线地形学
Pub Date : 1992-07-01 DOI: 10.1016/0920-2307(92)90002-I
B.K. Tanner, D.K. Bowen

The application of synchrotron radiation for X-ray topography is reviewed. For two types of experiment, dynamic studies and statistical surveys, the intensity and continuous spectrum of synchrotron radiation is particularly important but it is shown that the time structure and polarisation can also be exploited. The future potential of the technique is discussed.

综述了同步辐射在x射线地形学中的应用。对于两种类型的实验,动态研究和统计调查,同步辐射的强度和连续谱是特别重要的,但它表明,时间结构和极化也可以利用。讨论了该技术的未来潜力。
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引用次数: 23
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