Complete formation sequence of InAs quantum dots on lattice-mismatched InGaAs/GaAs substrates

S. Kanjanachuchai, T. Limwongse
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Abstract

The complete formation sequence of InAs quantum dots (QDs) on lattice-mismatched InGaAs cross-hatch substrate has been identified. The InAs QDs sequentially form at the following locations: the dislocation free end, the dislocation T-section, the dislocation intersection, the [1–10] dislocation line, the [110] dislocation line and the flat area. Different surface energies at these locations give rise to QD formation at different effective thicknesses and times.
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晶格不匹配InGaAs/GaAs衬底上InAs量子点的完整形成序列
在晶格不匹配的InGaAs交叉舱口衬底上,确定了InAs量子点的完整形成序列。InAs量子点依次在以下位置形成:位错自由端、位错t截面、位错交点、位错[1-10]线、位错[110]线、位错平坦区。这些位置的不同表面能导致不同有效厚度和时间的量子点形成。
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