16-element grown-junction InGaAs/InP PIN photodetector arrays on 2" diameter InP substrates

D. Spear, W. Lee, A. Smith, P. Dawe, M. Geear, S. Bland
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Abstract

The fabrication and performance characteristics of a linear 16-element InGaAs/InP PIN photodetector array suitable for 1.3-1.6 mu m wavelength applications are described. The detector design relies on a grown pn junction for the diode and avoids producing exposed InGaAs junctions, which are difficult to passivate. The array fabrication procedure is fully compatible with future monolithic integration with InP-based electronics. A satisfactory yield of good arrays has been obtained. Optical crosstalk measurements were performed at DC and RF with the array mounted in a grating demultiplexer.<>
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16元生长结InGaAs/InP PIN光电探测器阵列在2”直径的InP衬底
介绍了一种适用于1.3 ~ 1.6 μ m波长应用的16元InGaAs/InP PIN线性光电探测器阵列的制作和性能特点。探测器的设计依赖于二极管的生长pn结,并避免产生难以钝化的暴露InGaAs结。阵列制造过程完全兼容未来基于inp的电子器件的单片集成。获得了令人满意的好阵列产率。光学串扰测量在直流和射频下进行,阵列安装在光栅解复用器中。
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Effect of structural parameters on InGaAs/InAlAs 2DEG characteristics High speed InGaAs HBT devices and circuits High performance diffused InGaAs JFETs in OEICs Current-controlled liquid phase epitaxy of InAsP on InP substrates High power and high temperature operation of 1.5 mu m wavelength strained-layer InGaAs/InGaAsP SIPBH lasers
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