Features of Modeling the Processes of Formation of Films of Refractory Compounds

A. Goncharov, A. Yunda, Ivan S. Kolinko, S. Goncharova, Oleksii Fesenko
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Abstract

The features of modeling the processes of formation of films of refractory compounds are considered by the example of transition metal nitrides. A brief description of modern methods for modeling the growth of coatings is given. And also outlined the range of tasks to be solved.
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难熔化合物成膜过程建模的特点
以过渡金属氮化物为例,分析了难熔化合物成膜过程建模的特点。简要介绍了模拟涂层生长的现代方法。并概述了要解决的任务范围。
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