Comparative study of Au/Pd/Ni(P) surface finish in eutectic PbSn and Sn3Ag0.5Cu soldering systems

S. Peng, D. Lin, C. Ho
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Abstract

Recently, the Au/Pd/Ni(P) tri-layer has become one of the promising replacements for the Au/Ni(P) surface finish in array-array packaging applications. The key motivation for this developed trend is the additional Pd layer can prevent the Ni(P) from the galvanic hyper-corrosion that has long been recognized to be the root cause of “black pads”. In the present study, the solderability of the Au/Pd/Ni(P) [0.1(±0.03) µm /0.2(±0.02) µm /7 ±m in thickness] are evaluated using Sn37Pb and Sn3Ag0.5Cu for various soldering times of 5 – 300 seconds. Comparison of the results shows that the interfacial reactions in both soldering systems are strong time dependence. During Sn37Pb soldering, it is found that the Au layer can disappear in 5 seconds, exposing the underlying Pd to solder as a (Pd,Ni)Sn4 layer. The (Pd,Ni)Sn4 then breaks off at the roots of grains and spall into the solder after soldering for 15 additional seconds. In turn, the Ni(P) would contact with solder and forms a discontinuous, chunk-like Ni3Sn4. Beneath the Ni3Sn4, there is a layer of Ni3P. Interestingly, the reactions change dramatically when the Sn3Ag0.5Cu replaces the Sn37Pb for soldering. Firstly, both Au and Pd can be depleted by Sn3Ag0.5Cu in the beginning 5 seconds of soldering. Additionally, a dense (Cu,Ni)6Sn5 rather than Ni3Sn4 becomes the dominant reaction product over the Ni(P). Another interesting difference is that a much thinner Ni3P forms at the interface excepting the region that the Ni(P) is direct in tough with the solder. The variation in Ni3P can be attributed to a lower Ni consumption by forming a dense (Cu,Ni)6Sn5 than a scattered Ni3Sn4.
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共晶PbSn和Sn3Ag0.5Cu焊接体系中Au/Pd/Ni(P)表面光洁度的比较研究
近年来,Au/Pd/Ni(P)三层材料已成为阵列阵列封装中Au/Ni(P)表面处理的有前途的替代品之一。这一发展趋势的关键动机是额外的Pd层可以防止Ni(P)发生电偶超腐蚀,而电偶超腐蚀一直被认为是“黑垫”的根本原因。在本研究中,采用Sn37Pb和Sn3Ag0.5Cu对Au/Pd/Ni(P)[厚度为0.1(±0.03)µm /0.2(±0.02)µm /7±m]的焊接性能进行了评价,焊接时间为5 ~ 300秒。结果表明,两种焊接体系的界面反应均具有较强的时间依赖性。在Sn37Pb的焊接过程中,发现Au层可以在5秒内消失,暴露在下面的Pd作为(Pd,Ni)Sn4层进行焊接。在焊接15秒后,(Pd,Ni)Sn4在晶粒根部断裂并脱落到焊料中。反过来,Ni(P)将与焊料接触并形成不连续的块状Ni3Sn4。在Ni3Sn4下面,有一层Ni3P。有趣的是,当Sn3Ag0.5Cu取代Sn37Pb进行焊接时,反应发生了显著变化。首先,在焊接开始的5秒内,Sn3Ag0.5Cu可以耗尽Au和Pd。此外,致密的(Cu,Ni)6Sn5而不是Ni3Sn4成为主导反应产物。另一个有趣的区别是,除了Ni(P)与焊料直接接触的区域外,在界面处形成了更薄的Ni3P。Ni3P的变化可以归因于形成致密的(Cu,Ni)6Sn5而不是分散的Ni3Sn4,从而降低了Ni的消耗。
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