SEN's SAVING techniques for productivity enhancement

Abstract

Needless to say, productivity of ion implantation processes is a very important issue for economical device fabrication. Reduction of implant areas is one of the essential keys to increase a beam utilization factor for high-current ion implanters. SEN already developed the X-, Y-, D-, and F-SAVING system to address this issue. This time, another SAVING system, the O-SAVING, has been developed for the SHX-III/S. In result, the system reduces implant time in 40% from the original implant and more than 10% from the F-SAVING. This system can freely change the beam scan widths and positions, keeping the beam scan frequency constant. In this manner not only good uniformity is ensured but also a shape of implant area can be freely selected from arbitrary shapes such as a circle, a triangle, a semicircle, and so on.