NBTI aware IG-FinFET based SRAM design using adaptable trip-point sensing technique

N. Yadav, Shikha Jain, M. Pattanaik, G. K. Sharma
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引用次数: 7

Abstract

The progressive scaling demands effort from both the circuit and the device level, to cope with circuit variability and reliability issues. Advent of FinFET technology has suppresses the short channel effects and variability, but still suffers with self heating problem consequently increases temporal degradations. In this paper, we investigate severity of Negative Bias Temperature Instability (NBTI) and proposes an adaptable trip point sensing based compensation technique to satisfy performance metrics for NBTI aware Independent Gate (IG) FinFET based SRAM. Simulation results are carried out using HSPICE with PTM 32nm IG-FinFET technology demonstrate that threshold voltage deviates from its nominal value by 17%, causing 6% and 13% degradation in SNM and RNM, respectively under NBTI degradation at 125°C for 3 years. The proposed technique yields 42% reduced read failures under NBTI. Thus, proposed approach improves the stability of SRAM array during its operational life and hence, reliability of the system.
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基于自适应跳闸点传感技术的NBTI感知IG-FinFET SRAM设计
这种渐进式缩放需要电路和器件两方面的努力,以应对电路的可变性和可靠性问题。FinFET技术的出现抑制了短通道效应和可变性,但仍然存在自热问题,从而增加了时间退化。本文研究了负偏置温度不稳定性(NBTI)的严重程度,并提出了一种基于自适应触发点传感的补偿技术,以满足基于独立门(IG) FinFET的SRAM的性能指标。利用HSPICE与PTM 32nm igfinfet技术进行的仿真结果表明,在125°C下NBTI降解3年的情况下,阈值电压偏离标称值17%,导致SNM和RNM分别下降6%和13%。该技术在NBTI下的读取失败率降低了42%。因此,该方法提高了SRAM阵列在使用寿命期间的稳定性,从而提高了系统的可靠性。
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