Recent advances in 3- to 10-nm quantum optical lithography

Abstract

Development of semiconductor technologies requires innovative approaches. Optical lithography, as a key element in this process, needs to be extended into the sub-10 nm range. Manipulation of matter in this range, in order to produce complex patterns, is a challenge for lithographic techniques. A diffraction-unlimited method (quantum optical lithography) for nanofabrication is detailed with applications in prototyping functional nanostructures. The writing method was applied to two different materials: resist and fluorescent glass–ceramics. Complex patterns (rectangles, triangles, and letters) with 3-nm linewidth were obtained on Si3N4 transmission electron microscopy grids covered by the resist.