Substitutional Tungsten doping in Silicon Carbide introducing magnetic properties: A Computational DFT Approach

P. Patnaik, Dipan kumar Das, Subhraraj Panda, G. Mukhopadhyay
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Abstract

Small concentration of magnetic material, in general the transition metal atoms (TM) when doped into a semiconductor, it behaves as a diluted magnetic semiconductor (DMS). It has an application to Quantum computing & spintronic devices. DMS silicon carbide have strong coupling and high Curie temperature. The magnetic and electronic properties of SiC with TMs impurities have been in focus for theoretical and experimental researchers. Objective The objective of this work is to study the electrical and magnetic properties of tungsten doped cubic SiC. Comparing the density of states plot with and without impurity, the change in property happening due to the presence of tungsten is observed. Partial density of states, are also plotted and interpreted. Self-consistent spin polarized calculations are done to study the magnetic properties. Magnetic Moment is also calculated for substitutional doping of SiC at different sites. Tungsten doped 3C-SiC is investigated by using the first-principle energy code, Quantum Espresso that uses pseudopotential within Density Functional Theory (DFT). The calculations are done by density functional pseudopotential energy calculations in periodic systems by solving iteratively the Kohn Sham equation in a plane wave basis set. Both norm conserving and Vanderbilt USPP are used. Self-consistent iterations were performed until a convergence of total energy and total charge was obtained. We used different k-point meshes for different supercells with 16, 54 and 128 atoms giving results for carious impurity percentages. The formation energy values obtained indicate that W impurity prefers Si site than C site in cubic SiC. Presence of a narrow band towards the conduction band minimum is due to the W-d states for Si site substitution. Both spin-up and spin-down states contribute towards the valence band and a small contribution goes towards the conduction band. The magnetic moment values for C site substitution is lower than Si site substitution. It is observed when W doped with Si site of cubic silicon carbide shows ferromagnetic behavior. Hence, there is a possibility of 3C SiC doped with W at C site to behave as a semi- insulating material
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碳化硅中取代钨掺杂引入磁性:一种计算DFT方法
小浓度的磁性物质,一般将过渡金属原子(TM)掺杂到半导体中时,其表现为稀释磁性半导体(DMS)。它在量子计算和自旋电子器件中有应用。DMS碳化硅具有强耦合性和高居里温度。含TMs杂质的碳化硅的磁性和电子性能一直是理论和实验研究的热点。目的研究钨掺杂立方碳化硅的电学和磁性能。通过比较有杂质和没有杂质的态密度图,观察到由于钨的存在而发生的性质变化。也绘制和解释了状态的部分密度。通过自洽自旋极化计算来研究其磁性能。并计算了不同位置SiC取代掺杂的磁矩。利用密度泛函理论(DFT)中的赝势,利用第一原理能量码Quantum Espresso研究了钨掺杂的3C-SiC。通过迭代求解平面波基集上的Kohn Sham方程,计算周期系统的密度泛函伪势能。规范保护和Vanderbilt USPP都被使用。进行自洽迭代,直到得到总能量和总电荷的收敛。我们对含有16、54和128个原子的不同超级电池使用了不同的k点网格,得到了不同杂质百分比的结果。得到的生成能值表明,W杂质在立方碳化硅中倾向于Si位而不是C位。由于Si位取代的W-d态,在导带最小值处存在窄带。自旋向上和自旋向下都对价带有贡献,对导带有少量贡献。C位取代的磁矩值低于Si位取代的磁矩值。在立方碳化硅中掺入硅后,W表现出铁磁性。因此,在C位点掺杂W的3C SiC有可能表现为半绝缘材料
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来源期刊
Nanoscience and Nanotechnology - Asia
Nanoscience and Nanotechnology - Asia Engineering-Engineering (all)
CiteScore
1.90
自引率
0.00%
发文量
35
期刊介绍: Nanoscience & Nanotechnology-Asia publishes expert reviews, original research articles, letters and guest edited issues on all the most recent advances in nanoscience and nanotechnology with an emphasis on research in Asia and Japan. All aspects of the field are represented including chemistry, physics, materials science, biology and engineering mainly covering the following; synthesis, characterization, assembly, theory, and simulation of nanostructures (nanomaterials and assemblies, nanodevices, nano-bubbles, nano-droplets, nanofluidics, and self-assembled structures), nanofabrication, nanobiotechnology, nanomedicine and methods and tools for nanoscience and nanotechnology.
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