Sofya Torosyan, A. Kteyan, V. Sukharev, J. Choy, F. Najm
{"title":"Novel physics-based tool-prototype for electromigration assessment in commercial-grade power delivery networks","authors":"Sofya Torosyan, A. Kteyan, V. Sukharev, J. Choy, F. Najm","doi":"10.1116/6.0000617","DOIUrl":null,"url":null,"abstract":"A recently developed novel methodology for electromigration (EM) failure assessment in power/ground grids of integrated circuits is employed in the electronic design automation tool prototype. The tool performs the analysis of stress evolution in interconnect trees for detecting EM-induced voiding locations and tracks resistance increase in the voided wires based on a physics-based model of voiding kinetics. Increased resistances of the branches of power/ground networks lead to a voltage drop increase in grid nodes. The instance in time when a designer-specified voltage-drop threshold is reached defines the EM-induced time-to-failure. Monte-Carlo simulation, performed around the core engine that simulates the stress over time using randomly generated atomic diffusivities and critical stress values, leads to the mean-time-to-failure of the grid, along with voiding probabilities of the interconnect branches.","PeriodicalId":17652,"journal":{"name":"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","volume":"1 1","pages":"013203"},"PeriodicalIF":0.0000,"publicationDate":"2021-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0000617","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
A recently developed novel methodology for electromigration (EM) failure assessment in power/ground grids of integrated circuits is employed in the electronic design automation tool prototype. The tool performs the analysis of stress evolution in interconnect trees for detecting EM-induced voiding locations and tracks resistance increase in the voided wires based on a physics-based model of voiding kinetics. Increased resistances of the branches of power/ground networks lead to a voltage drop increase in grid nodes. The instance in time when a designer-specified voltage-drop threshold is reached defines the EM-induced time-to-failure. Monte-Carlo simulation, performed around the core engine that simulates the stress over time using randomly generated atomic diffusivities and critical stress values, leads to the mean-time-to-failure of the grid, along with voiding probabilities of the interconnect branches.