Кремниевые решетки с блеском для мягкого рентгеновского и экстремального ультрафиолетового излучения: влияние формы профиля штриха и случайной шероховатости на дифракционную эффективность

Л. И. Горай, В. А. Шаров, Д.В. Мохов, Т.Н. Березовская, К.Ю. Шубина, Е В Пирогов, А.C. Дашков, А Д Буравлев
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Abstract

The effect of the groove profile shape and random roughness of the reflecting facet of five silicon diffraction gratings (1°-4° blaze angle, period 0.4, 1.4, 2, and 4 μm, various coatings) operating in the soft X-ray and extreme ultraviolet radiation ranges on the outflow of the diffraction efficiency from working orders is studied. Diffraction gratings were fabricated by wet etching of Si(111) vicinal wafers and characterized by atomic force microscopy to determine the shape of the groove profile and roughness. The diffraction efficiency of gratings operating in classical and conical diffraction mounts was calculated based on realistic groove profiles by computer simulation using the PCGrateTM code and taking into account the scattering intensity using Nevot-Croce or Debye-Waller corrections or using the Monte Carlo method (rigorously). The effect of the groove profile shape and roughness on the diffraction efficiency of the fabricated Si gratings is shown.
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软x射线和极端紫外线辐射的硅晶格:细纹轮廓形状和随机粗糙度对衍射效率的影响
研究了在软x射线和极紫外辐射范围内工作的5种硅衍射光栅(火焰角为1°~ 4°,周期为0.4、1.4、2和4 μm,不同涂层)的槽型形状和反射面随机粗糙度对衍射效率流出量的影响。采用湿法刻蚀法制备了Si(111)相邻晶片的衍射光栅,并用原子力显微镜对其进行了表征,确定了沟槽的形状和粗糙度。采用PCGrateTM程序,在考虑散射强度的情况下,采用Nevot-Croce或Debye-Waller校正或蒙特卡罗方法(严格地)计算了工作在经典和锥形衍射座上的光栅的衍射效率。研究了沟槽形状和粗糙度对硅光栅衍射效率的影响。
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