コンピュータシミュレーションによる粉体および線材へのイオン注入分布の一般則;コンピュータシミュレーションによる粉体および線材へのイオン注入分布の一般則;Universal Expression of Projected Range Distributions for Spherical and Cylindrical Shape Target by Computer Simulation

Abstract

Ion implantation into microspheres and wires may open a new application ˆeld. Therefore, we extended the TRIM (Transport of Ions in Matter) code that simulates ion distributions for substrates to be applicable to spherical and cylindrical targets. Next, we ˆtted simulated proˆles calculated by the TRIM code to the experimental ones to determine adequate parameters of electronic stopping powers. And, we simulated about various combinations to use the extended TRIM code which used parameters. Calculated projected ranges and implantation energies are reduced to modiˆed reduced projected ranges and average reduced energy. Also, we derive the relations between the average reduced energy and the modiˆed reduced projected ranges for spherical and cylindrical targets.