首页 > 最新文献

Journal of The Vacuum Society of Japan最新文献

英文 中文
半導体表面における光励起キャリアダイナミクスの時間・空間分解計測;半導体表面における光励起キャリアダイナミクスの時間・空間分解計測;Spatio-temporal Observation of Photogenerated Carrier Dynamics on a Semiconductor Surface 半导体表面的光激发载流子动力学的时间、空间分解计测;半导体表面的光激发载流子动力学的时间、空间分解计测;光电generated Spatio-temporal Observation Carrier Dynamics on a Semiconductor Surface
Pub Date : 2017-10-01 DOI: 10.3131/JVSJ2.60.388
K. Fukumoto
27, 2017, Accepted June 20, 2017 ) A system for time-resolved photoemission electron microscopy ( TR  PEEM ) conducted with femtosecond laser pulses has been de-veloped to explore the photogenerated electron dynamics on semiconductor surfaces. Attained space and time resolutions were 100 nm and 100 fs, respectively. The present manuscript introduces the TR  PEEM system, and also reports the observation of diŠerent photogenerated electron lifetimes in diŠerent nanoscale structural defects randomly distributed on a semiconductor surface. The results were explained based on Schockley-Read-Hall ( SRH ) model relating the carrier recombination time and the defect state density. The
开发了一种飞秒激光脉冲时间分辨光电电子显微镜(TRPEEM)系统,用于探索半导体表面的光生电子动力学。获得的空间和时间分辨率分别为100 nm和100 fs。本文介绍了TRPEEM系统,并报道了在半导体表面随机分布的diŠerent纳米级结构缺陷中diŠerent光生电子寿命的观察。基于Schockley-Read-Hall (SRH)模型解释了载流子复合时间与缺陷态密度之间的关系。的
{"title":"半導体表面における光励起キャリアダイナミクスの時間・空間分解計測;半導体表面における光励起キャリアダイナミクスの時間・空間分解計測;Spatio-temporal Observation of Photogenerated Carrier Dynamics on a Semiconductor Surface","authors":"K. Fukumoto","doi":"10.3131/JVSJ2.60.388","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.388","url":null,"abstract":"27, 2017, Accepted June 20, 2017 ) A system for time-resolved photoemission electron microscopy ( TR  PEEM ) conducted with femtosecond laser pulses has been de-veloped to explore the photogenerated electron dynamics on semiconductor surfaces. Attained space and time resolutions were 100 nm and 100 fs, respectively. The present manuscript introduces the TR  PEEM system, and also reports the observation of diŠerent photogenerated electron lifetimes in diŠerent nanoscale structural defects randomly distributed on a semiconductor surface. The results were explained based on Schockley-Read-Hall ( SRH ) model relating the carrier recombination time and the defect state density. The","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86805158","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Degree Reduction of Graphene Oxide toward a High Carrier Mobility 高载流子迁移率的氧化石墨烯的高度还原
Pub Date : 2017-08-01 DOI: 10.3131/jvsj2.60.300
Seiji Obata, Minoru Sato, K. Saiki
Graphene: a monolayer sheet of graphite shows many attractive properties, which are expected to be applied to various devices. Development of a high throughput method has been required to realize the applications. Chemical exfoliation via graphene oxide (GO) has been considered one of the promising methods. However, the graphene reduced from GO showed poor crystallinity and mobility than that of mechanically exfoliated graphene. Many reduction methods have been investigated to obtain high mobility graphene from GO lately. In this review, we introduce a novel reduction method which we have developed to convert GO to graphene by explaining their advantages and some ‰aws to be solved.
石墨烯:单层石墨显示出许多吸引人的特性,有望应用于各种器件。为了实现这些应用,需要开发一种高通量的方法。利用氧化石墨烯(GO)进行化学剥离被认为是一种很有前途的方法。然而,氧化石墨烯还原后的石墨烯结晶度和迁移率较机械剥离后的石墨烯差。近年来,人们研究了多种还原法制备高迁移率石墨烯的方法。在这篇综述中,我们介绍了我们开发的一种新的还原方法,通过解释它们的优点和一些需要解决的‰定律,将氧化石墨烯转化为石墨烯。
{"title":"High Degree Reduction of Graphene Oxide toward a High Carrier Mobility","authors":"Seiji Obata, Minoru Sato, K. Saiki","doi":"10.3131/jvsj2.60.300","DOIUrl":"https://doi.org/10.3131/jvsj2.60.300","url":null,"abstract":"Graphene: a monolayer sheet of graphite shows many attractive properties, which are expected to be applied to various devices. Development of a high throughput method has been required to realize the applications. Chemical exfoliation via graphene oxide (GO) has been considered one of the promising methods. However, the graphene reduced from GO showed poor crystallinity and mobility than that of mechanically exfoliated graphene. Many reduction methods have been investigated to obtain high mobility graphene from GO lately. In this review, we introduce a novel reduction method which we have developed to convert GO to graphene by explaining their advantages and some ‰aws to be solved.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88579526","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Design of Advanced Functional ZnO Conductive Thin Films with Arc Plasma 电弧等离子体高性能ZnO导电薄膜的设计
Pub Date : 2017-08-01 DOI: 10.3131/JVSJ2.60.292
Tetsuya Yamamoto, J. Nomoto, H. Kitami, T. Sakemi, H. Makino, Keisuke L. I. Kobayashi, Y. Aoki, S. Kishimoto
Design of Advanced Functional ZnO Conductive Thin Films with Arc Plasma Tetsuya YAMAMOTO1, Junichi NOMOTO1, Hisashi KITAMI1,2, Toshiyuki SAKEMI2, Hisao MAKINO1, Keisuke KOBAYASHI1, Yasushi AOKI2 and Seiichi KISHIMOTO3 1Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami-shi, Kochi 7828502, Japan 2Technology Research Center, Sumitomo Heavy Industries Ltd., 19 Natsushima-cho, Yokosuka-shi, Kanagawa 2378555, Japan 3Department of Mechanical Engineering, Kochi National College of Technology, 2001 Otsu Monobe, Nankoku-shi, Kochi 7838508, Japan
设计先进的功能氧化锌与电弧等离子体导电薄膜Tetsuya山本1,野本Junichi1,Hisashi KITAMI1,2,Toshiyuki SAKEMI2,众所周知牧野1,小林圭佑1,靖青木2和岸本Seiichi31研究所,科钦科技大学185 Miyanokuchi Tosayamada-cho, Kami-shi,科钦782年至8502年,日本2技术研究中心,住友重工业有限公司19 Natsushima-cho Yokosuka-shi,神奈川2378555,日本3高知县工业大学机械工程系,2001高知县南国市大津部,7838508
{"title":"Design of Advanced Functional ZnO Conductive Thin Films with Arc Plasma","authors":"Tetsuya Yamamoto, J. Nomoto, H. Kitami, T. Sakemi, H. Makino, Keisuke L. I. Kobayashi, Y. Aoki, S. Kishimoto","doi":"10.3131/JVSJ2.60.292","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.292","url":null,"abstract":"Design of Advanced Functional ZnO Conductive Thin Films with Arc Plasma Tetsuya YAMAMOTO1, Junichi NOMOTO1, Hisashi KITAMI1,2, Toshiyuki SAKEMI2, Hisao MAKINO1, Keisuke KOBAYASHI1, Yasushi AOKI2 and Seiichi KISHIMOTO3 1Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami-shi, Kochi 7828502, Japan 2Technology Research Center, Sumitomo Heavy Industries Ltd., 19 Natsushima-cho, Yokosuka-shi, Kanagawa 2378555, Japan 3Department of Mechanical Engineering, Kochi National College of Technology, 2001 Otsu Monobe, Nankoku-shi, Kochi 7838508, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86794807","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Infrared Absorption Spectroscopy of Water Clusters Isolated in Cryomatrices 低温基质中水团簇的红外吸收光谱研究
Pub Date : 2017-07-01 DOI: 10.3131/JVSJ2.60.256
K. Yamakawa
Infrared spectroscopy combined with the matrix isolation method, where samples are trapped by a cold and inert-molecular solid, has been used for the investigations of small water clusters. After the descriptions of the stable structures and vibrations of the clusters, the author explains experimental techniques of the matrix isolation and demonstrates recent works on the clusters isolated in the solids of rare gases, para-hydrogen, and methane as well as the hydrogen adsorption layer on a vapor deposited NaCl ˆlm. The relation between the frequency shift of the hydrogen-bonded OH stretch and the matrix critical-temperature is also shown.
红外光谱与基质分离方法相结合,其中样品被冷和惰性分子固体捕获,已用于研究小水团簇。在描述了团簇的稳定结构和振动之后,作者解释了基质分离的实验技术,并展示了最近在稀有气体、对氢和甲烷固体中分离的团簇以及气相沉积NaCl - lm上的氢吸附层的工作。给出了氢键OH拉伸的频移与基体临界温度的关系。
{"title":"Infrared Absorption Spectroscopy of Water Clusters Isolated in Cryomatrices","authors":"K. Yamakawa","doi":"10.3131/JVSJ2.60.256","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.256","url":null,"abstract":"Infrared spectroscopy combined with the matrix isolation method, where samples are trapped by a cold and inert-molecular solid, has been used for the investigations of small water clusters. After the descriptions of the stable structures and vibrations of the clusters, the author explains experimental techniques of the matrix isolation and demonstrates recent works on the clusters isolated in the solids of rare gases, para-hydrogen, and methane as well as the hydrogen adsorption layer on a vapor deposited NaCl ˆlm. The relation between the frequency shift of the hydrogen-bonded OH stretch and the matrix critical-temperature is also shown.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87867235","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;Ellipsometric Monitoring of First Stages of Graphene Growth in Plasma-Enhanced Chemical Vapor Deposition 等离子化学气相沉积中石墨烯生长过程的偏振分析监测;等离子化学气相沉积中石墨烯生长过程的偏振分析监测;Ellipsometric Monitoring of First Stages of Graphene Growth in plasma -增强化学装置deposition
Pub Date : 2017-04-01 DOI: 10.3131/JVSJ2.60.135
Yasuaki Hayashi, Satoshi Ishidoshiro, Shinya Yamada, Yuma Kawamura
Ellipsometry monitoring was carried out in-situ for the analyses of substrate surface in the ˆrst stages of graphene growth in magnetron plasma-enhanced chemical vapor deposition. By the comparison of the experimentally obtained trajectory of ellipsometric parameters on the CD coordinate plane to that of the calculated ones, it has been found that graphene tends to grow parallel to substrate surface under the pressure of 10 Pa while perpendicularly under that of 200 Pa.
在磁控管等离子体增强化学气相沉积中,对石墨烯生长第一阶段的衬底表面进行了原位椭偏监测。将实验得到的CD坐标平面上的椭偏参数轨迹与计算得到的椭圆偏参数轨迹进行比较,发现石墨烯在10 Pa压力下趋向于平行于衬底表面生长,而在200 Pa压力下趋向于垂直生长。
{"title":"プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;Ellipsometric Monitoring of First Stages of Graphene Growth in Plasma-Enhanced Chemical Vapor Deposition","authors":"Yasuaki Hayashi, Satoshi Ishidoshiro, Shinya Yamada, Yuma Kawamura","doi":"10.3131/JVSJ2.60.135","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.135","url":null,"abstract":"Ellipsometry monitoring was carried out in-situ for the analyses of substrate surface in the ˆrst stages of graphene growth in magnetron plasma-enhanced chemical vapor deposition. By the comparison of the experimentally obtained trajectory of ellipsometric parameters on the CD coordinate plane to that of the calculated ones, it has been found that graphene tends to grow parallel to substrate surface under the pressure of 10 Pa while perpendicularly under that of 200 Pa.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90441180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Characteristics of Crystal/Cold Cathode Wide Range Vacuum Gauge 晶体/冷阴极宽量程真空计的特性
Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.193
N. Ohsako, Masahide Kuroiwa
{"title":"Characteristics of Crystal/Cold Cathode Wide Range Vacuum Gauge","authors":"N. Ohsako, Masahide Kuroiwa","doi":"10.3131/JVSJ2.60.193","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.193","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76398266","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
大気圧プラズマアクチュエータの流体制御によるメタン-水素改質の特性;大気圧プラズマアクチュエータの流体制御によるメタン-水素改質の特性;Characteristic of the Methane-hydrogen Reforming by the Fluid Control Using DBD Plasma Actuator 大气压力等离子体致动器流体控制下的甲烷-氢改性的特性;大气压力等离子体致动器流体控制下的甲烷-氢改性的特性;Characteristic of the methan -hydrogen Reforming by the Fluid Control Using DBD Plasma Actuator
Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.334
S. Yamanaka, Masako Shindo, Akiyoshi Nagata
Characteristic of the methane-hydrogen reforming is studied on the plasma reforming eŠects by the electrode structure and the additional magnetic ˆeld using the dielectric barrier discharge plasma actuator (DBDPA). The hydrogen production rate was improved by using the multiple electrode structure of DBDPA that achieved high rate of 10.6 as compared with 1.1 on single structure. Moreover, it was found that the DBD plasma conˆnement was improved by the eŠect of ‰uid control around DBDPA resulting from the addition of the magnetic ˆeld and the hydrogen product rate could increase to 13.4 by using the cusp ˆeld conˆguration.
采用介质阻挡放电等离子体作动器(DBDPA),通过电极结构和外加磁场对等离子体重整eŠects中甲烷-氢重整特性进行了研究。采用DBDPA的多电极结构提高了制氢率,其产氢率达到了10.6,而单电极结构的产氢率为1.1。此外,还发现在DBDPA附近添加磁场可使DBD等离子体的粘度控制eŠect提高,采用尖场配置可使产氢率提高到13.4。
{"title":"大気圧プラズマアクチュエータの流体制御によるメタン-水素改質の特性;大気圧プラズマアクチュエータの流体制御によるメタン-水素改質の特性;Characteristic of the Methane-hydrogen Reforming by the Fluid Control Using DBD Plasma Actuator","authors":"S. Yamanaka, Masako Shindo, Akiyoshi Nagata","doi":"10.3131/JVSJ2.60.334","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.334","url":null,"abstract":"Characteristic of the methane-hydrogen reforming is studied on the plasma reforming eŠects by the electrode structure and the additional magnetic ˆeld using the dielectric barrier discharge plasma actuator (DBDPA). The hydrogen production rate was improved by using the multiple electrode structure of DBDPA that achieved high rate of 10.6 as compared with 1.1 on single structure. Moreover, it was found that the DBD plasma conˆnement was improved by the eŠect of ‰uid control around DBDPA resulting from the addition of the magnetic ˆeld and the hydrogen product rate could increase to 13.4 by using the cusp ˆeld conˆguration.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79231903","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of Pulse Power Supplies as High Power Impulse Magnetron Sputtering (HiPIMS) Equipment Components for Medical Diamond Like Carbon (DLC) Film Fabrication Processes 医用类碳金刚石(DLC)薄膜制备工艺中作为高功率脉冲磁控溅射(HiPIMS)设备组件的脉冲电源的开发
Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.372
Masahide Kuroiwa, T. Nakatani
{"title":"Development of Pulse Power Supplies as High Power Impulse Magnetron Sputtering (HiPIMS) Equipment Components for Medical Diamond Like Carbon (DLC) Film Fabrication Processes","authors":"Masahide Kuroiwa, T. Nakatani","doi":"10.3131/JVSJ2.60.372","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.372","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89572006","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Field Emission from Carbon Films with No Protrusions with High Aspect Ratios 高纵横比无凸碳膜的场发射特性
Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.13
S. Horie, K. Asanagi, T. Myojin, T. Higuchi, Y. Yamada, M. Sasaki
Field emission features from Si and W tips are drastically improved upon coating even with simple carbon ˆlms. In this paper, in order to obtain clues to clarify the mechanism, we examine atomistic STM observations including local barrier height (LBH) and ˆeld emission imagings of the carbon ˆlms. And we also examine the ˆeld emission features from the shape-controlled W tips before and after the carbon coatings, enabling us to estimate the local electric ˆeld at the tip apex. From the STM observations, we ˆnd that the carbon ˆlm consists of nm-scale grains with various electronic properties and that the FE current varies grain by grain and is higher near the edge of each grain. The eŠective work functions evaluated from the slopes of the Fowler-Nordheim (FN) plot are constant regardless of the thickness of the carbon coating, although they are largely scattered for the ˆlms thinner than 1 nm. On the basis of the observed results, we discuss the mechanism of low macroscopic ˆeld emission from carbon ˆlms.
即使是简单的碳涂层,Si和W尖端的场发射特性也得到了显著改善。在本文中,为了获得澄清机制的线索,我们研究了原子STM观测,包括碳- lms的局部势垒高度(LBH)和场发射成像。我们还研究了碳涂层前后形状控制的W尖端的场发射特征,使我们能够估计尖端尖端的局部电场。从STM观察中,我们发现碳m由具有各种电子特性的纳米级晶粒组成,并且FE电流随晶粒而变化,并且在每个晶粒的边缘附近更高。无论碳涂层的厚度如何,从Fowler-Nordheim (FN)图的斜率评估的eŠective功函数都是恒定的,尽管它们在厚度小于1 nm的范围内大部分是分散的。在此基础上,讨论了碳- lms的低宏观场发射机理。
{"title":"Field Emission from Carbon Films with No Protrusions with High Aspect Ratios","authors":"S. Horie, K. Asanagi, T. Myojin, T. Higuchi, Y. Yamada, M. Sasaki","doi":"10.3131/JVSJ2.60.13","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.13","url":null,"abstract":"Field emission features from Si and W tips are drastically improved upon coating even with simple carbon ˆlms. In this paper, in order to obtain clues to clarify the mechanism, we examine atomistic STM observations including local barrier height (LBH) and ˆeld emission imagings of the carbon ˆlms. And we also examine the ˆeld emission features from the shape-controlled W tips before and after the carbon coatings, enabling us to estimate the local electric ˆeld at the tip apex. From the STM observations, we ˆnd that the carbon ˆlm consists of nm-scale grains with various electronic properties and that the FE current varies grain by grain and is higher near the edge of each grain. The eŠective work functions evaluated from the slopes of the Fowler-Nordheim (FN) plot are constant regardless of the thickness of the carbon coating, although they are largely scattered for the ˆlms thinner than 1 nm. On the basis of the observed results, we discuss the mechanism of low macroscopic ˆeld emission from carbon ˆlms.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90966754","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
平成29年度熊谷記念真空科学論文賞,真空技術賞,真空進歩賞,真空会誌賞の審査経過と受賞業績紹介 平成29年度熊谷记念真空科学论文赏,真空技术赏,真空进歩赏,真空会志赏の审查経过と受赏业绩绍介
Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.244
大介 藤田
{"title":"平成29年度熊谷記念真空科学論文賞,真空技術賞,真空進歩賞,真空会誌賞の審査経過と受賞業績紹介","authors":"大介 藤田","doi":"10.3131/JVSJ2.60.244","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.244","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76827113","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Journal of The Vacuum Society of Japan
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1