VIISta 900 3D: Advanced medium current implanter

F. Sinclair, J. Olson, D. Rodier, Alex Eidukonis, T. Thanigaivelan, S. Todorov
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引用次数: 4

Abstract

The continued advance of semiconductor technology, including the emergence of 3D device architectures, demands ever-increasing precision of dose and angle control in ion implantation. The Varian Semiconductor Equipment business unit of Applied Materials has enhanced the design of the industry's leading medium current implanter to meet the production requirements of advanced technology nodes. Improvements to the implanter architecture include more precise angle control, increased beam utilization, better uniformity and repeatability and longer maintenance intervals. Advanced ion optics allow measurement and control of beam shape.
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vivista 900 3D:先进的中电流种植机
半导体技术的不断进步,包括3D器件架构的出现,要求离子注入的剂量和角度控制精度不断提高。应用材料公司瓦里安半导体设备业务部增强了业界领先的中电流植入器的设计,以满足先进技术节点的生产要求。植入器结构的改进包括更精确的角度控制,提高光束利用率,更好的均匀性和可重复性以及更长的维护间隔。先进的离子光学允许测量和控制光束形状。
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