In-situ synchrotron X-ray diffraction measurement of epitaxial FeRh thin films

Sung-Uk Jang, S. Hyun, Hwan-Soo Lee, Soon-Ju Kwon, Ji-Hong Kim, K. Park, Hak-Joo Lee
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Abstract

The magnetic properties and structure of FeRh thin film epitaxially grown onto MgO(001) substrate were studied by MPMS(Magnetic Properties Measure System) and in-situ temperature synchrotron XRD(X-ray Diffraction). The transition temperature of FeRh thin films was around 380K. Both M-T curve and d-spacing changes correspond to each other very closely. Abrupt changes in the lattice constants can be observed from the in-situ analysis. Also, there is the likelihood of existence of a new phase.
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外延FeRh薄膜的原位同步加速器x射线衍射测量
采用磁性能测量系统(MPMS)和x射线衍射仪(XRD)研究了在MgO(001)衬底上外延生长的FeRh薄膜的磁性能和结构。FeRh薄膜的转变温度在380K左右。M-T曲线和d-间距变化之间的对应关系非常密切。从原位分析中可以观察到晶格常数的突变。此外,有可能存在一个新阶段。
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