Derivatives of Sri Lankan Vein Graphite: Atomic Scale Study of Graphene Oxide and Reduced Graphene Oxide

Q3 Engineering Nanoscience and Nanotechnology - Asia Pub Date : 2023-08-25 DOI:10.2174/2210681213666230825112219

D. Dahanayake, Hansani Yashomala, C. Sandaruwan, Haneen Packeer Ally, S. Gunasekara, Veranja Karunarathne, G. Amaratunga

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Abstract

The present study examines the atomic-scale structures of Graphene Oxide (GO) and Reduced Graphene Oxide (RGO). Electron microscopic studies on Sri Lankan vein graphite are considerably less; hence, this study focuses on the atomic-scale study of Sri Lankan vein graphite, using advanced electron microscopic techniques. The purpose of this research is to utilize the data obtained to explore the multidisciplinary characteristics of graphene to the maximum prospectively. We report an atomic-scale study on Sri Lankan vein graphite (purest) derivatives using advanced electron microscopic techniques, including High-Resolution Transmission Electron Microscope (HRTEM), Scanning Transmission Electron Microscope (STEM), and Electron Energy Loss Spectroscopy (EELS). The present study examines the atomic-scale structures of Graphene Oxide (GO) and Reduced Graphene Oxide (RGO). The results obtained exhibited an inter-atomic layer distance of 3.54 Å for RGO. The EELS study performed with the electron dose optimization for GO and RGO distinguished the differences in the C K edge with the oxygen functionalities. The XPS study confirmed the changes in oxygen functionalities obtained with EELS. The advanced electron microscopic techniques and other molecular spectroscopic analysis techniques allowed us to obtain a comprehensive study on Sri Lankan vein graphene-based structural and chemical features on an atomic scale.

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斯里兰卡脉石墨衍生物:氧化石墨烯和还原氧化石墨烯的原子尺度研究

本研究考察了氧化石墨烯(GO)和还原氧化石墨烯(RGO)的原子尺度结构。对斯里兰卡脉状石墨的电镜研究相当少;因此，本研究的重点是斯里兰卡脉石墨的原子尺度研究，使用先进的电子显微镜技术。本研究的目的是利用所获得的数据来最大限度地探索石墨烯的多学科特性。我们报告了一项斯里兰卡脉石墨(最纯)衍生物的原子尺度研究，使用先进的电子显微镜技术，包括高分辨率透射电子显微镜(HRTEM)，扫描透射电子显微镜(STEM)和电子能量损失谱(EELS)。本研究考察了氧化石墨烯(GO)和还原氧化石墨烯(RGO)的原子尺度结构。结果表明，RGO的原子间层距离为3.54 Å。对氧化石墨烯和还原氧化石墨烯进行电子剂量优化的EELS研究区分了氧官能团在C - K边的差异。XPS研究证实了EELS获得的氧官能团的变化。先进的电子显微镜技术和其他分子光谱分析技术使我们能够在原子尺度上全面研究斯里兰卡脉石墨烯的结构和化学特征。

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来源期刊

Nanoscience and Nanotechnology - Asia Engineering-Engineering (all)

CiteScore

1.90

自引率

0.00%

发文量

期刊介绍： Nanoscience & Nanotechnology-Asia publishes expert reviews, original research articles, letters and guest edited issues on all the most recent advances in nanoscience and nanotechnology with an emphasis on research in Asia and Japan. All aspects of the field are represented including chemistry, physics, materials science, biology and engineering mainly covering the following; synthesis, characterization, assembly, theory, and simulation of nanostructures (nanomaterials and assemblies, nanodevices, nano-bubbles, nano-droplets, nanofluidics, and self-assembled structures), nanofabrication, nanobiotechnology, nanomedicine and methods and tools for nanoscience and nanotechnology.