Optical emission intensity overshoot and electron heating mechanisms during the re-ignition of pulsed capacitively coupled Ar plasmas

Keith Hernandez, A. Press, M. Goeckner, L. Overzet
{"title":"Optical emission intensity overshoot and electron heating mechanisms during the re-ignition of pulsed capacitively coupled Ar plasmas","authors":"Keith Hernandez, A. Press, M. Goeckner, L. Overzet","doi":"10.1116/6.0000679","DOIUrl":null,"url":null,"abstract":"Phase resolved optical emission spectroscopy (PROES) measurements were combined with measurements of the optical emission intensity (OEI) and electrical characteristics (RF current and voltage, power, and DC bias voltage) as a function of time during the re-ignition of Ar plasmas pulsed at 100 Hz and 10 kHz. The OEI exhibits a large overshoot at the 100 Hz pulsing rate even though no such overshoot is present in any of the electrical characteristics. The OEI overshoot occurs at a point in time when the RF power, voltage, DC bias voltage, and electron density are all smaller than they become later in the glow. PROES measurements in combination with the time resolved electrical characteristics indicate that the heating mechanism for the electrons changes during the time of the overshoot in the OEI from stochastic heating to a combination of stochastic and ohmic heating. This combination appears to enable a more efficient transfer of the electrical energy into the electrons.","PeriodicalId":17652,"journal":{"name":"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2021-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0000679","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Phase resolved optical emission spectroscopy (PROES) measurements were combined with measurements of the optical emission intensity (OEI) and electrical characteristics (RF current and voltage, power, and DC bias voltage) as a function of time during the re-ignition of Ar plasmas pulsed at 100 Hz and 10 kHz. The OEI exhibits a large overshoot at the 100 Hz pulsing rate even though no such overshoot is present in any of the electrical characteristics. The OEI overshoot occurs at a point in time when the RF power, voltage, DC bias voltage, and electron density are all smaller than they become later in the glow. PROES measurements in combination with the time resolved electrical characteristics indicate that the heating mechanism for the electrons changes during the time of the overshoot in the OEI from stochastic heating to a combination of stochastic and ohmic heating. This combination appears to enable a more efficient transfer of the electrical energy into the electrons.
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脉冲电容耦合氩等离子体重燃过程中的光发射强度超调和电子加热机制
将相位分辨光学发射光谱(PROES)测量与光学发射强度(OEI)和电特性(射频电流和电压、功率和直流偏置电压)作为100 Hz和10 kHz脉冲氩等离子体重燃过程中时间的函数的测量相结合。OEI在100hz脉冲速率下表现出较大的超调,尽管在任何电特性中都没有这种超调。OEI超调发生在射频功率、电压、直流偏置电压和电子密度都小于发光后期时的某个时间点。PROES测量结合时间分辨电特性表明,在OEI超调期间,电子的加热机制从随机加热转变为随机和欧姆加热的组合。这种组合似乎能够更有效地将电能转移到电子中。
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