Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study

Romel Hidayat, Hye-Lee Kim, Hohoon Kim, Y. Byun, Jongsoo Lee, Won-Jun Lee
{"title":"Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study","authors":"Romel Hidayat, Hye-Lee Kim, Hohoon Kim, Y. Byun, Jongsoo Lee, Won-Jun Lee","doi":"10.1116/6.0000796","DOIUrl":null,"url":null,"abstract":"We studied heteroleptic Hf precursors with a linked amido-cyclopentadienyl ligand by density functional theory (DFT) calculation to enable high-temperature atomic layer deposition processes. The thermolysis and hydrolysis of Hf precursors were simulated to expect thermal stability and reactivity with hydroxyl groups. The effects of alkyl groups in the precursors were also investigated. We constructed the hydroxylated HfO2 surface and then simulated the surface reactions of the precursors. The precursors with the linked ligand showed higher activation energies for thermolysis and lower activation energies for hydrolysis as compared with CpHf(NMe2)3. The precursors with the linked ligand also showed low activation energies for the serial ligand exchange reactions on the HfO2 surface, significantly lower than those of CpHf(NMe2)3. Therefore, the DFT calculation suggests that the Hf precursors with the linked ligand are promising due to their thermal stability and reactivity better than CpHf(NMe2)3.","PeriodicalId":17571,"journal":{"name":"Journal of Vacuum Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2021-03-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0000796","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6

Abstract

We studied heteroleptic Hf precursors with a linked amido-cyclopentadienyl ligand by density functional theory (DFT) calculation to enable high-temperature atomic layer deposition processes. The thermolysis and hydrolysis of Hf precursors were simulated to expect thermal stability and reactivity with hydroxyl groups. The effects of alkyl groups in the precursors were also investigated. We constructed the hydroxylated HfO2 surface and then simulated the surface reactions of the precursors. The precursors with the linked ligand showed higher activation energies for thermolysis and lower activation energies for hydrolysis as compared with CpHf(NMe2)3. The precursors with the linked ligand also showed low activation energies for the serial ligand exchange reactions on the HfO2 surface, significantly lower than those of CpHf(NMe2)3. Therefore, the DFT calculation suggests that the Hf precursors with the linked ligand are promising due to their thermal stability and reactivity better than CpHf(NMe2)3.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
铪前驱体与偕胺-环戊二烯基配体的表面反应:密度泛函理论研究
我们通过密度泛函理论(DFT)计算,研究了具有连接的酰胺-环戊二烯基配体的杂电性Hf前驱体,以实现高温原子层沉积工艺。模拟Hf前驱体的热裂解和水解,期望热稳定性和与羟基的反应性。研究了烷基对前驱体的影响。我们构建了羟基化的HfO2表面,然后模拟了前驱体的表面反应。与CpHf(NMe2)3相比,该配体具有较高的水解活化能和较低的水解活化能。与CpHf(NMe2)3相比,具有连接配体的前驱体在HfO2表面的一系列配体交换反应也表现出较低的活化能。因此,DFT计算表明,具有连接配体的Hf前驱体具有比CpHf(NMe2)3更好的热稳定性和反应性,因此具有很好的前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Interfacial reactivity in the Co/CuO samples as investigated by x-ray photoelectron spectroscopy Modification of discharge sequences to control the random dispersion of flake particles during wafer etching Effect of atomic-scale microstructures on TiZrV non-evaporable getter film activation E-mode AlGaN/GaN HEMTs using p-NiO gates Review on remote phonon scattering in transistors with metal-oxide-semiconductor structures adopting high-k gate dielectrics
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1