{"title":"On Approach to Optimize Manufacturing of a Transistors with Two Sources to Decrease their Dimensions","authors":"P. E.L","doi":"10.5121/IJOE.2017.6301","DOIUrl":null,"url":null,"abstract":"In this paper we introduce an approach to optimize technological process of manufacturing of heterotransistors with two sources to decrease their dimensions. Framework the approach we consider a heterostructure with specific configuration. After manufacturing of the heterostructure we consider doping of several areas of the heterostructure by diffusion or ion implantation. The doping was finished by optimized annealing of dopant and/or radiation defects. We introduce an analytical approach for prognosis of mass transport to obtain the required results.","PeriodicalId":14375,"journal":{"name":"International Journal of Online Engineering","volume":"55 1","pages":"01-11"},"PeriodicalIF":0.0000,"publicationDate":"2017-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Online Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.5121/IJOE.2017.6301","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper we introduce an approach to optimize technological process of manufacturing of heterotransistors with two sources to decrease their dimensions. Framework the approach we consider a heterostructure with specific configuration. After manufacturing of the heterostructure we consider doping of several areas of the heterostructure by diffusion or ion implantation. The doping was finished by optimized annealing of dopant and/or radiation defects. We introduce an analytical approach for prognosis of mass transport to obtain the required results.
期刊介绍：
We would like to inform you, that iJOE, the ''International Journal of Online Engineering'' will accept now also papers in the field of Biomedical Engineering and e-Health''. iJOE will therefore be published from January 2019 as the ''International Journal of Online and Biomedical Engineering''. The objective of the journal is to publish and discuss fundamentals, applications and experiences in the fields of Online Engineering (remote engineering, virtual instrumentation and online simulations, etc) and Biomedical Engineering/e-Health. The use of cyber-physical systems, virtual and remote controlled devices and remote laboratories are the directions for advanced teleworking/e-working environments. In general, online engineering is a future trend in engineering and science. Due to the growing complexity of engineering tasks, more and more specialized and expensive equipment as well as software tools and simulators, shortage of highly qualified staff, and the demands of globalization and collaboration activities, it become essential to utilize cyber cloud technologies to maximize the use of engineering resources. Online engineering is the way to address these issues. Considering these, one focus of the International Journal of Online and Biomedical Engineering is to provide a platform to publish fundamentals, applications and experiences in the field of Online Engineering, for example: Remote Engineering Internet of Things Cyber-physical Systems Digital Twins Industry 4.0 Virtual Instrumentation. An important application field of online engineering tools and principles are Biomedical Engineering / e-Health. Topics we are interested to publish are: Automation Technology for Medical Applications Big Data in Medicine Biomedical Devices Biosensors Biosignal Processing Clinical Informatics Computational Neuroscience Computer-Aided Surgery.
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