Impact of post-annealing temperature on optical and surface properties of tellurium doped ZnO nanocrystalline films

A.U. Sonawan, B. Sonawane
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Abstract

Investigated in this work is the effect of post-annealing temperature on ZnO nanocrystalline thin films doped with 5 at.% tellurium. The spin coating method was used to deposit films on the microscopic glass substrates. XRD, AFM, and UV-spectro-photometry were used to characterize the films structure, surface roughness and optical properties. The XRD spectra showed that the nanocrystalline films are of monocrystalline nature. AFM has confirmed the nanocrystalline character of tellurium-doped ZnO. The transmission of exposed films has been decreased with the increase of annealing temperature. The average transmission of all the films has been revealed to be higher than 80%. The optical band gap varies slightly with post-annealing temperature.
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后退火温度对碲掺杂ZnO纳米晶薄膜光学和表面性能的影响
本文研究了退火后温度对掺杂5at的ZnO纳米晶薄膜的影响。%碲。采用自旋镀膜法在微细玻璃基板上沉积薄膜。采用XRD、AFM和uv光谱光度法对膜的结构、表面粗糙度和光学性能进行了表征。XRD谱分析表明,纳米晶膜为单晶性质。原子力显微镜证实了碲掺杂ZnO的纳米晶性质。随着退火温度的升高,曝光膜的透射率降低。所有影片的平均传输率都在80%以上。光学带隙随退火后温度变化不大。
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