Photo-BJMOSFET Based on SOI Film and Its Analytical Compact Model

Hai-Qing Xie, Yun Zeng, Jianping Zeng, Guo-Liang Zhang, Taihong Wang
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Abstract

A novel photoelectric device-photo-BJMOSFET (Bipolar Junction Metal-Oxide-Semiconductor Field Effect Transistor) fabricated on SOI film was proposed in this paper. The photo-BJMOSFET operates in the depletion but not inversion region to decrease dark current. Due to two kinds of carriers (electron and hole) in this device, it is more sensitive than the conventional MOS structure under the same operating conditions and structure parameters. Numerical calculation of the analytical model indicates that photo-BJMOSFET has high sensitivity and SNR (Signal to Noise Ratio). In addition, it can eliminate the high dark current of PN junction under CMOS process, and promise compatibility with CMOS process.
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基于SOI薄膜的光电- bjmosfet及其解析紧凑模型
提出了一种在SOI薄膜上制备的新型光电器件——双极结金属氧化物半导体场效应晶体管(bjmosfet)。光- bjmosfet工作在耗尽区,而不是反转区,以减少暗电流。由于该器件中存在两种载流子(电子和空穴),在相同的工作条件和结构参数下,其灵敏度高于传统MOS结构。分析模型的数值计算表明,光- bjmosfet具有较高的灵敏度和信噪比。此外,它还可以消除CMOS工艺下PN结的高暗电流,并保证与CMOS工艺的兼容性。
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