Method for Measuring the Thickness of Photoresist on Spherical Surface

Abstract

This paper shows and discusses a new type method which is two-wavelength method for measuring the thickness of photoresist on spherical surface. By two-wavelength method measuring, examine the change of intensity which reflected lights compare with incident lights, achieve the purpose of measuring the thickness of photoresist on spherical surface. The method for measuring the thickness of photoresist on plane surface has been approved, and the method of measuring the thickness on spherical surface is discussed. Key word: Photoresist; Lithography; Spherical-surface;