D. Choi, S. Madden, A. Rode, Rongping Wang, B. Luther-Davies
{"title":"Fabrication Process Development for As2S3 Planar Waveguides using Standard Semiconductor Processing","authors":"D. Choi, S. Madden, A. Rode, Rongping Wang, B. Luther-Davies","doi":"10.1109/COINACOFT.2007.4519163","DOIUrl":null,"url":null,"abstract":"We have developed an effective fabrication process for As<sub>2</sub>S<sub>3</sub> waveguides. A bottom anti-reflection coating provides a suitable layer to protect the As<sub>2</sub>S<sub>3</sub> film from attack by the alkaline developer whilst CHF<sub>3</sub> plasma enables the patterning of waveguides with vertical-profile and smooth sidewalls.","PeriodicalId":57196,"journal":{"name":"光通信研究","volume":"12 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2007-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"光通信研究","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.1109/COINACOFT.2007.4519163","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We have developed an effective fabrication process for As2S3 waveguides. A bottom anti-reflection coating provides a suitable layer to protect the As2S3 film from attack by the alkaline developer whilst CHF3 plasma enables the patterning of waveguides with vertical-profile and smooth sidewalls.
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