{"title":"Er-doped Si-based electroluminescent capacitors: Role of different host matrices on the electrical and luminescence properties","authors":"Y. Berencén, J. Ramírez, B. Garrido","doi":"10.1109/CDE.2013.6481388","DOIUrl":null,"url":null,"abstract":"We report on the electrical and electroluminescence properties of four different layers based on Er-doped silicon oxide (or nitride) with (or without) silicon nanocrystals. Electrical measurements have allowed us to identify that samples composed by silicon nitride matrices present a Poole-Frenkel-type conduction, whereas those ones formed by silicon oxide matrices show a Fowler-Nordheim tunneling mechanism. In addition, infrared power efficiency at 1.54 μm has shown to be two orders of magnitude larger for Er-doped silicon oxide layers than for Er-doped silicon nitrides. Moreover, an interesting trade off between power efficiency at 1.54 μm and device operation lifetime has been observed by comparing both Er-doped silicon oxides and Er-doped silicon nitride layers.","PeriodicalId":6614,"journal":{"name":"2013 Spanish Conference on Electron Devices","volume":"74 1","pages":"245-248"},"PeriodicalIF":0.0000,"publicationDate":"2013-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 Spanish Conference on Electron Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CDE.2013.6481388","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We report on the electrical and electroluminescence properties of four different layers based on Er-doped silicon oxide (or nitride) with (or without) silicon nanocrystals. Electrical measurements have allowed us to identify that samples composed by silicon nitride matrices present a Poole-Frenkel-type conduction, whereas those ones formed by silicon oxide matrices show a Fowler-Nordheim tunneling mechanism. In addition, infrared power efficiency at 1.54 μm has shown to be two orders of magnitude larger for Er-doped silicon oxide layers than for Er-doped silicon nitrides. Moreover, an interesting trade off between power efficiency at 1.54 μm and device operation lifetime has been observed by comparing both Er-doped silicon oxides and Er-doped silicon nitride layers.