Versatile method of sub-micro particle pattern formation using self-assembly and two-step transfer

Abstract

We propose a method of sub-micro particle pattern formation with high productivity, flexibility and accuracy of pattern. The proposed process is composed of template-assisted self-assembly (TASA) for particle self-assembly and subsequent two-step transfer of the assembled particles. In the self-assembly process, the pattern of 70% was successfully self-assembled. In the first transfer step, the transfer yield of 79% was obtained by SAM (self-assembled monolayer) coated carrier substrate. In the second transfer step, the transfer temperature of 115degC provided the maximum transfer yield of 85%. The overall process yield of 48% was achieved by optimized process parameters and it was successfully demonstrated that the proposed method fabricates any sub-micro particle pattern.