Investigation of Bond PAD Crystal Defect for Different Cover Transmission Rate

C. Sun
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Abstract

With the advancement of VLSI technology and the continuous development of metal oxide semiconductor field effect transistors (MOSFET), process nodes are constantly improving, integrated circuit package precision requirements are also increasing, and the difficulty of controlling bonding quality and reliability is increasing, the crystal of the pad on the surface of the aluminum (Al) pad has become a real problem in the semiconductor industry. When doing a shear test, this kind of defect will cause the package to fail[Fig. 1]. The essay proposes that different products have different cover transmission rate, which will affect the degree of pad crystal a degree of influence of different cover T/R on the crystal of the pad and the solution to provide a strong evidence for the subsequent solution of the pad crystal problem. The experimental results show that the product cover T/R is the smaller, the greater the chances crystal of the pad.
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不同覆盖传输速率下键合PAD晶体缺陷的研究
随着VLSI技术的进步和金属氧化物半导体场效应晶体管(MOSFET)的不断发展,工艺节点不断改进,集成电路封装精度要求也越来越高,控制键合质量和可靠性的难度也越来越大,铝(Al)焊盘表面的焊盘晶体问题已成为半导体行业的现实难题。在进行剪切试验时,这种缺陷会导致包装失效[图2]。1]。本文提出不同的产品有不同的盖透射率,这将影响衬垫结晶度,不同的盖透射率对衬垫结晶度和解决方案的影响程度,为后续解决衬垫结晶度问题提供有力证据。实验结果表明,产品盖T/R越小,衬垫结晶体的几率越大。
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