Application of Laboratory Based Laue Micro-XRD for Generalised Grain Orientation Mapping

P. Lynch, W. Stevenson, D. Fox, A. Ghaderi, L. Xie, M. R. Barnett
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引用次数: 1

Abstract

A fully automated laboratory Micro X-ray Laue diffraction system capable of illuminating individual grains in polycrystalline sample is described. A high brightness tungsten micro-focus X-ray source coupled with a capillary focussing optic is used to define a variable spot, ranging in size from 20micron to 200 micron, on the sample. Extension of the Laue technique for micro-texture mapping is then achieved by raster scanning the sample in the focal plane of the focussing optic. The attributes of this new methodology is highlighted by a series of 3 case studies. The first case study demonstrates the high-angular resolution capabilities based on orientation mapping in large grain Si steel electrical transformer plates. An angular resolution better than 0.01degree was readily achieved. Further, the orientation and grain morphology was verified based on synchrotron Laue maps acquired from the same region of interest. Case study 2 addresses the minimum grain size/resolution that can be practically measured. By use of the 20micron probe size orientation maps were acquired for an additive manufactured Ti-5553 wall. A bimodal grain size could be identified. These results were in good agreement with EBSD measurements performed on a sample prepared under the same conditions. Finally, demonstration of large scale grain orientation mapping was performed on an as-received Ti-5553 billet. An orientation map of 65 x 35mm at a step resolution of 0.2mm was used to map the orientation and change in grain morphology across the billet.
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基于实验室的lae微xrd在广义晶粒取向制图中的应用
描述了一种全自动实验室微x射线劳厄衍射系统,该系统能够照亮多晶样品中的单个颗粒。高亮度钨微聚焦x射线源与毛细管聚焦光学元件相结合,用于在样品上定义大小从20微米到200微米不等的可变光斑。然后通过在聚焦光学的焦平面上对样品进行光栅扫描,扩展了用于微纹理映射的Laue技术。这一新方法的特性通过一系列的3个案例研究得到了突出体现。第一个案例研究展示了基于取向映射的大晶粒硅钢变压器板的高角分辨率能力。很容易获得优于0.01度的角分辨率。此外,基于从同一感兴趣区域获得的同步加速器劳厄图,验证了取向和晶粒形态。案例研究2解决了可以实际测量的最小晶粒尺寸/分辨率。通过使用20微米探针尺寸获得了添加剂制造的Ti-5553壁的取向图。可以识别出双峰粒度。这些结果与在相同条件下制备的样品上进行的EBSD测量结果非常一致。最后,在Ti-5553坯料上进行了大规模晶粒取向映射演示。采用步进分辨率为0.2mm的65 x 35mm的取向图来绘制整个坯料的取向和晶粒形态变化。
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