Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani
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引用次数: 0
Abstract
Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan
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