Contribution to the growth of InP and InGaAsP optoelectronic device materials by atmospheric- and low-pressure MOVPE using tertiarybutylphosphine

A. Ougazzaden, R. Mellet, Y. Gao, E. Rao, A. Mircea
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引用次数: 1

Abstract

The realization of 1.3- mu m laser devices with active light-emitting layers grown from the alternative phosphorous precursor tertiary butylphosphine (TBP) instead of phosphine is discussed. In addition to better safety, an advantage of TBP is easier achievement of high composition uniformity due to a smaller influence of the growth temperature. The main drawback of TBP is its price, which is much higher than for phosphine.<>
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利用叔丁基膦常压和低压MOVPE生长InP和InGaAsP光电器件材料的贡献
讨论了用替代磷前驱体叔丁基膦(TBP)代替磷化氢生长有源发光层的1.3 μ m激光器件的实现。除了更好的安全性外,TBP的优点是由于生长温度的影响较小,更容易实现高成分均匀性。TBP的主要缺点是价格,比磷化氢高得多。
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Effect of structural parameters on InGaAs/InAlAs 2DEG characteristics High speed InGaAs HBT devices and circuits High performance diffused InGaAs JFETs in OEICs Current-controlled liquid phase epitaxy of InAsP on InP substrates High power and high temperature operation of 1.5 mu m wavelength strained-layer InGaAs/InGaAsP SIPBH lasers
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