Challenges of Coating Deposition on Polymer Substrate by Magnetron Sputtering

Abstract

Hard coating deposition on plastics by magnetron sputtering encounters the common problem of the coating delamination if its thickness is more than 50-100 nm. The present study researches Tantalum-based coating deposition focusing on the optimal deposition regimes allowing thicker coating deposition on Polypropylene substrates without delamination. It is shown that the main reason for the delamination is compressive stress in the coating appearing due to bombardment by energetic particles. The delamination problem solution has been found in decreasing the bombarding particle energy by increasing gas pressure.