Electrical properties of chemically doped graphene with Aluminum ions

P. Jain, C. Zhang, Jiang'ao Huang, Kamal Ahmad, D. Xie, Zewen Liu
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Abstract

In this article, we report a Field Effect Transistor (FET) with Aluminum doped graphene channel. The graphene is doped by spin coating a chemical dopant solution which tailored the electrical properties of graphene, such as transfer characteristics and output characteristics. The Doping of graphene was successfully verified by X-Ray photoelectron spectra (XPS) measurements. The testing results showed that the Dirac point (the value of gate to source voltage at which minimum value of drain to source current is attained) in transfer characteristics of Graphene Field Effect Transistor (GFET) shifted from VGS = 6.42 V to VGS = 40 V after doping. The slope of the output characteristics of GFET for VGS = 0 V increased from 3.56 to 5.44.
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铝离子化学掺杂石墨烯的电学性质
本文报道了一种掺铝石墨烯沟道的场效应晶体管(FET)。石墨烯通过自旋镀膜的方式掺杂,这种化学掺杂溶液可以调整石墨烯的电学特性,如转移特性和输出特性。通过x射线光电子能谱(XPS)测量成功地验证了石墨烯的掺杂。测试结果表明,掺杂后石墨烯场效应晶体管(GFET)转移特性中的Dirac点(漏极到源极电流最小时的栅极到源电压值)从VGS = 6.42 V转变为VGS = 40 V。当VGS = 0 V时,GFET的输出特性斜率由3.56增加到5.44。
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