介质隔离LDMOSFET的高温性能:表征、仿真与分析

R. Sunkavalli, B. J. Baliga, Y. Huang
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引用次数: 6

摘要

本文报道了550v复用dildmosfet静态参数的温度依赖性。高温测量在25/spl°C-200/spl°C之间进行,间隔为25/spl°C。测量的参数包括导通电阻、阈值电压、跨导、衬底偏置效应、击穿电压和漏电流。精确的分析模型,由广泛的二维数值模拟支持,已经开发出解释和预测器件性能。
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High temperature performance of dielectrically isolated LDMOSFET: characterization, simulation and analysis
The temperature dependence of the static parameters of the 550 V RESURF DI LDMOSFET is reported. High temperature measurements were carried out from 25/spl deg/C-200/spl deg/C at intervals of 25/spl deg/C. The parameters measured include the on-resistance, threshold voltage, transconductance, effect of substrate bias, breakdown voltage and leakage current. Accurate analytic models, supported by extensive two-dimensional numerical simulations, have been developed to explain and predict device performance.
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High temperature performance of dielectrically isolated LDMOSFET: characterization, simulation and analysis Improving the gate oxide integrity of very high voltage MCT and IGBT devices by external gettering of metal impurities A trench-gate LIGBT structure and two LMCT structures in SOI substrates Advanced power module using GaAs semiconductors, metal matrix composite packaging material, and low inductance design Improvement of the breakdown voltage of GaAs-FETs using low-temperature-grown GaAs insulator
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