BGA封装中Sn-Ag、Sn-Ag- cu与Sn-Pb-Ag钎料的微观结构、接头强度及破坏机理

Ka Yau Lee, Ming Li, D. Olsen, W.T. Chen, B.T.C. Tan, S. Mhaisalkar
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引用次数: 49

摘要

研究了Cu/Ni/Au BGA焊盘金属化过程中Sn-Ag、Sn-Ag-Cu和Sn-Pb-Ag体系的微观结构、结合强度和破坏机制。在150℃时效后,Sn- pb - ag体系在界面处形成Ni/sub 3/Sn/sub 4/和(Au,Ni)Sn/sub 4/两层结构。然而,在两种无铅体系中都没有检测到这种结构。在上述温度下1000小时后,在界面处仅发现Sn- ag体系中存在一层Ni/sub 3/Sn/sub 4/相,Sn- ag - cu体系中存在一层Cu-Sn-Ni-Au金属间化合物。(Au,Ni)Sn/sub / 4三元化合物的形成是由于Au在界面处的重新沉降导致Sn- pb - ag体系的严重脆性破坏。相比之下,Sn-Ag和Sn-Ag- cu体系在150/spl度/C老化1000小时后,只在焊料内部失效。并对三种体系的焊球接头强度和失效模式进行了评价。两种无铅体系均表现出良好的抗热老化性能,焊球接头强度保持在1.60至1.70 kgf左右。另一方面,随着老化时间的推移,Sn-Pb-Ag体系的机械性能下降,强度低至1.20 kgf。测定了金属间层在125、150和175℃时的生长速率和活化能。
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Microstructure, joint strength and failure mechanism of Sn-Ag, Sn-Ag-Cu versus Sn-Pb-Ag solders in BGA packages
The microstructure, joint strength and failure mechanisms of Sn-Ag and Sn-Ag-Cu versus Sn-Pb-Ag systems on Cu/Ni/Au BGA pad metallization have been investigated after multiple reflow and high temperature storage. Sn-Pb-Ag system gave rise to a two-layer structure, i.e. Ni/sub 3/Sn/sub 4/ and (Au,Ni)Sn/sub 4/, at the interface after aging at 150/spl deg/C. However, such a structure was not detected in both lead-free systems. Only a layer of Ni/sub 3/Sn/sub 4/ phase in the Sn-Ag system and a layer of Cu-Sn-Ni-Au intermetallic compound in Sn-Ag-Cu system were found at the interfaces, even after 1000 hours at the afore-mentioned temperature. The formation of the (Au,Ni)Sn/sub 4/ ternary compound was due to re-settlement of Au at the interface which led to severe brittle failure in the Sn-Pb-Ag system. In contrast, Sn-Ag and Sn-Ag-Cu systems failed exclusively inside the solder after aging at 150/spl deg/C up to 1000 hours. The solder ball joint strength of the three systems and failure modes were also evaluated. Both lead-free systems showed good resistance to thermal aging with a solder ball joint strength maintained at about 1.60 to 1.70 kgf. The Sn-Pb-Ag system, on the other hand, degraded in mechanical performance over aging time, reaching a strength as low as 1.20 kgf. The growth rates of intermetallic layers at 125, 150, and 175/spl deg/C, and the activation energy were also determined in this study.
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